Forced Thin Film Flow Reactor with Adjustable Clearance
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Solution Overview
Problem
Existing microreactors face challenges in scaling up, handling reactions with solid separation or gas generation, and processing high viscosity materials, and struggle with cleaning and sterilization due to narrow clearance requirements and adhesion issues.
Innovation Solution
A forced thin film-type flow reactor with a pressure balancing mechanism and a mechanical clearance mechanism that allows adjustable clearance between processing surfaces, enabling effective processing and cleaning/sterilization without disassembly, and facilitating the removal of adhered materials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the clearance between processing surfaces is reduced to form a thin film, then mixing and reaction efficiency are improved, but cleaning and sterilization become difficult due to insufficient flow
Solution Approach 1:
The clearance between processing surfaces is made adjustable rather than fixed. During reaction operations, the clearance is maintained at a small value (0.1-5mm) to form a thin film for efficient mixing and reaction. During cleaning and sterilization operations, the clearance is increased to a large value (5-50mm) to allow sufficient flow of cleaning fluids and steam, enabling effective CIP and SIP operations without disassembly
2Use of energy by moving object
If the clearance between processing surfaces is reduced, then heat transfer efficiency is improved, but adhered materials are difficult to remove
Solution Approach 1:
The adjustable clearance mechanism allows the system to switch between a small clearance state (0.1-5mm) during reaction operations for efficient heat transfer and mixing, and a large clearance state (5-50mm) during cleaning operations to facilitate easy removal of adhered materials through enhanced fluid flow and mechanical action
3Ease of operation
If the clearance between processing surfaces is increased for cleaning, then cleaning flow is improved, but reaction efficiency decreases
Solution Approach 1:
The system operates in periodic cycles, switching between reaction mode (small clearance 0.1-5mm for high reaction efficiency) and cleaning mode (large clearance 5-50mm for sufficient cleaning flow). The adjustable clearance mechanism enables this periodic transition, and the control system coordinates the timing of clearance adjustment with the reaction and cleaning operation cycles
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The reactor achieves scalable processing, efficient handling of complex reactions, ensures sufficient cleaning/sterilization flow, and allows for easy removal of adhered materials without disassembly, enhancing operational efficiency and safety.
Implementation Method 1
the separating force is defined by at least one kind selected from the group consisting of a centrifugal force generated by relative rotation of a first processing surface and a second processing surface
Implementation Method 2
a dynamic pressure which is a dynamic pressure generated in a groove-like depression formed in at least one of the both processing surfaces
Implementation Method 3
a centrifugal force generated by relative rotation of a first processing surface and a second processing surface
Implementation Method 4
the fluid to be processed which is pressurized by a fluid pressure imparting mechanism
Data Source
AI summary
A forced thin film-type flow reactor is provided with a clearance adjustment mechanism that allows the clearance to be set and adjusted by an alternative means. The flow reactor processes a fluid to be processed by passing the fluid to be processed between a first processing surface and a second processing surface capable of moving towards and away from each other, and the flow reactor comprises a pressure balancing mechanism and a mechanical clearance mechanism. The pressure balancing mechanism forms a minute first clearance by providing pressure balance between the pressure applied by the fluid to be processed, which acts in the direction in which the first processing surface and the second processing surface move away from each other, and a force produced by a back pressure mechanism, which acts in the direction in which the first processing surface and the second processing surface move towards each other.