Foreline Organic Effluent Abatement Using Disassociated Oxygen
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Solution Overview
Problem
Semiconductor processing equipment faces challenges in effectively abating organic compounds from effluent gases, leading to reduced equipment longevity and safety concerns due to deposits in the exhaust line.
Innovation Solution
A method and system for treating effluent gases by flowing hydrocarbon processing gases into a processing chamber, creating organic byproducts, and then treating these byproducts in an abatement reaction zone using a mixture of disassociated oxygen-containing gas and inert gas, forming carbon monoxide and carbon dioxide to reduce harmful deposits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If in-line plasma sources or remote plasma sources are used for abatement of effluent gases, then organic compounds can be treated, but equipment life is significantly reduced due to deposits in the exhaust line
Solution Approach 1:
The patent introduces an oxygen plasma source that generates highly reactive oxygen species (O atoms, O2 radicals) which aggressively oxidize organic compounds in the effluent stream. This accelerated oxidation converts hydrocarbons and other organic deposits into volatile oxidation products (CO, CO2, H2O) that can be easily pumped away, preventing the formation of refractory carbon deposits that would otherwise accumulate in the exhaust line and reduce equipment life
Solution Approach 2:
The oxygen plasma acts as an intermediary substance that mediates between the harmful organic effluent and the vacuum pumping system. By introducing this reactive oxygen intermediary, the patent transforms the organic compounds into a different chemical form (oxidized species) that is compatible with the vacuum system, thereby protecting downstream equipment from damage while maintaining process efficiency
2Productivity
If more organics are added into the effluent exhaust line for technology advancements in carbon deposition processes, then substrate processing capability is improved, but downstream equipment life is significantly reduced
Solution Approach 1:
The patent converts the harmful effect of increased organic load (which would normally cause deposits and equipment failure) into a beneficial outcome by using oxygen plasma to oxidize these organics. The same organic compounds that would damage equipment are instead transformed into volatile gases that can be safely removed, allowing carbon deposition processes to be intensified without compromising downstream equipment life
3Manufacturing precision
If organic byproducts are exhausted into the foreline, then substrate processing is completed, but harmful deposits form in the exhaust line
Solution Approach 1:
The patent segments the exhaust line into two functional zones: a first portion dedicated to substrate processing and carbon deposition, and a second portion (after the plasma source) dedicated to organic compound oxidation and removal. This spatial segmentation allows the system to simultaneously achieve high-quality film deposition on substrates while preventing deposits in the downstream exhaust line by treating organics in a separate oxidation zone
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach extends equipment life, reduces maintenance intervals, and enhances safety by converting organic materials into more benign forms, thereby mitigating premature equipment failure and safety risks.
Implementation Method 1
mixing a disassociated oxygen-containing gas and the organic byproducts in the abatement reaction zone, and forming at least carbon monoxide and carbon dioxide from the mixture
Implementation Method 2
The remote plasma source is disposed about 20 cm to about 40 cm length from the foreline
Data Source
AI summary
A method and system for treating effluent from a processing chamber are disclosed herein. In one example, the effluent is treated by flowing a hydrocarbon processing gas into a processing chamber having a substrate disposed therein, performing a process on the substrate using the hydrocarbon processing gas that creates organic byproducts, exhausting the organic byproducts from the processing chamber into a foreline having an abatement reaction zone, and treating the organic byproducts in the abatement reaction zone. The treating of the organic byproducts comprises mixing a disassociated oxygen-containing gas and the organic byproducts in the abatement reaction zone, and forming at least carbon monoxide and carbon dioxide from the mixture of the disassociated oxygen-containing gas and the organic byproducts.