Freestanding Electrostatic Deflector for Uniform Beamlet Scanning
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Solution Overview
Problem
Existing charged particle optical systems face challenges in achieving uniform deflection of beamlets due to complex constructions and stray fields, leading to reduced resolution and pattern generation accuracy, especially when used as scanning deflectors.
Innovation Solution
A charged particle optical system with freestanding electrodes that generate a uniform electric field, allowing for precise deflection of beamlets with reduced potential voltage difference and improved mechanical stability, enabling high-frequency scanning and accurate pattern stitching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a multi-pole deflector (octopole) is used to achieve simultaneous deflection in two orthogonal directions, then deflection capability in x and y directions is improved, but device complexity increases due to curved plates with cylindrical or conical segments
Solution Approach 1:
The deflector is segmented into multiple independent planar deflector units, each responsible for deflection in one direction. By arranging multiple segmented deflector units in sequence, the system achieves simultaneous deflection in both x and y directions while maintaining the simplicity of planar plate construction, thus resolving the contradiction between deflection capability and construction complexity
Solution Approach 2:
Multiple planar deflector units are merged in series within the same optical path. Each unit contributes to the overall deflection capability, and their combined effect enables simultaneous deflection in orthogonal directions without requiring complex multi-pole structures, thereby achieving high adaptability with simple construction
2Device complexity
If planar deflectors are used with sequential deflection in x and y directions at different z-positions, then construction simplicity is maintained, but deflection precision deteriorates due to sequential rather than simultaneous deflection
Solution Approach 1:
The solution transitions from sequential deflection at different z-positions to simultaneous deflection in the same transverse plane by introducing multiple planar deflector units arranged side-by-side or in sequence within the same z-position. This dimensional reorganization allows both x and y deflection to occur simultaneously while maintaining construction simplicity, thus resolving the contradiction between construction simplicity and deflection precision
3Device complexity
If electrodes are deposited on projection lenses or substrates, then device complexity is reduced, but stray field effects increase leading to reduced resolution
Solution Approach 1:
The electrode structure is extracted from the projection lenses or substrate surfaces and reconfigured as independent, well-defined planar plates with controlled geometry. This separation allows for precise control of electric field boundaries, minimizing stray field effects while maintaining structural simplicity through the use of straightforward planar electrode designs rather than complex deposited patterns
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves improved uniformity and control over beamlet deflection, reducing stray field effects and enhancing scanning accuracy and resolution, particularly suitable for maskless lithography applications.
Implementation Method 1
an electrostatic deflector for deflecting the beamlets, the electrostatic deflector comprising first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets
Implementation Method 2
A charged particle optical system with freestanding electrodes that generate a uniform electric field, allowing for precise deflection of beamlets
Data Source
AI summary
A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.