Functionalized PAES Polymers for High-Temperature Lithography
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Solution Overview
Problem
Current polymer compositions used in lithographic processes for 3D printing lack sufficient mechanical properties and thermal stability, especially when exposed to high temperatures above 150°C, making them unsuitable for producing articles with retained mechanical properties and thermal stability.
Innovation Solution
Development of functionalized poly(aryl ether sulfone) (PAES) polymers that can be used in photofabrication processes, incorporating alpha-olefin functional groups, which remain stable and can be cured with UV light, even at temperatures above their glass transition temperature, resulting in high thermal and mechanical properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If liquid polymerizable compositions are used in lithographic processes, then good resolution and ease of use are achieved, but mechanical properties and thermal stability of the fabricated articles are moderate
Solution Approach 1:
The patent changes the chemical structure parameters of the polymer by introducing aromatic rings, ether linkages, and sulfone groups into the backbone. This structural modification increases chain rigidity and intermolecular interactions, thereby enhancing mechanical properties and thermal stability while maintaining the liquid state at room temperature for easy processing
2Strength
If polymers with better mechanical properties are used, then strength is improved, but they need to be melted above their melting temperature to be used in lithographic processes and require high thermal stability
Solution Approach 1:
The patent modifies the polymer structure by incorporating rigid aromatic segments and sulfone groups that increase thermal stability, allowing the polymer to maintain its mechanical properties at elevated temperatures. The glass transition temperature is elevated above the processing temperature range, eliminating the need for melting while enabling high-temperature processing in lithographic applications
3Productivity
If conventional polymer compositions are used in lithographic processes, then fabrication speed is achieved, but thermal stability above 150°C is insufficient
Solution Approach 1:
The patent creates a composite molecular structure within the polymer chain by combining aromatic rings, ether linkages, and sulfone groups. This composite structure provides both the processability needed for lithographic fabrication and exceptional thermal stability above 150°C, as the rigid aromatic-sulfone segments resist thermal degradation while maintaining structural integrity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The functionalized PAES polymers maintain high mechanical and thermal stability even after exposure to high temperatures, enabling the production of 3D articles with improved properties suitable for high-temperature applications.
Implementation Method 1
lithographic processes in which light is used to cure the functionalized PAES polymers
Data Source
AI summary
The present invention relates to functionalized poly(aryl ether sulfones) polymers. The invention further relates to polymer compositions including the functionalized poly(aryl ether sulfone) polymers. Still further, the invention relates to lithographic methods to form three-dimensional (3D) objects that incorporate the aforementioned polymer compositions.