Substrate Processing Furnace Maintenance Stabilization

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Solution Overview

Problem

In semiconductor manufacturing, the automatic maintenance processes in substrate processing apparatuses can disrupt the furnace environment at the start of the film-forming process, leading to instability and potential reductions in productivity due to unpredictable maintenance triggers based on predetermined threshold values.

Innovation Solution

A method is introduced where a maintenance recipe is determined and executed as part of the pre-processing in the substrate processing apparatus, allowing for stabilization of the furnace environment before the film-forming process begins, by assessing and addressing maintenance needs proactively.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If automatic maintenance process is executed when current value reaches predetermined threshold, then maintenance is performed timely, but furnace environment stability deteriorates

Engineering Contradiction:
Improvemaintenance timingVSAvoidfurnace environment stability
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent applies preliminary action by determining whether to execute a maintenance recipe during the pre-processing step, before the film-forming process begins. This allows maintenance activities to be completed in advance, preventing disruptions to the furnace environment during the actual film-forming process, thus maintaining environmental stability while ensuring timely maintenance

Inventive Principle:
Principle #10Preliminary action

2Productivity

If maintenance process is executed automatically, then productivity is improved by reducing manual intervention, but furnace environment control worsens

Engineering Contradiction:
Improveapparatus productivityVSAvoidfurnace environment control
Core Design Contradiction:
ProductivityVSStability of the object's composition

Solution Approach 1:

By determining maintenance execution during pre-processing before the film-forming process starts, the system maintains automated operation (improving productivity) while preventing maintenance-related disruptions during the critical film-forming phase (preserving furnace environment control)

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent segments the processing into distinct phases: pre-processing where maintenance determination occurs, and film-forming process where environmental stability is maintained. This segmentation allows automated maintenance decisions without compromising furnace environment control during the actual processing

Inventive Principle:
Principle #1Segmentation

3Reliability

If maintenance recipe is executed during film-forming process, then maintenance needs are addressed, but manufacturing precision deteriorates

Engineering Contradiction:
Improvemaintenance executionVSAvoidfilm-forming process precision
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent determines maintenance execution during pre-processing, before the film-forming process begins. This timing ensures that any necessary maintenance is completed in advance, preventing disruptions to the film-forming process and thereby maintaining manufacturing precision while still addressing maintenance needs

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS20210134683A1Method of Manufacturing Semiconductor Device, Non-transitory Computer-readable Recording Medium and Substrate Processing Apparatus
Publication Date: 2021.05.06 KOKUSAI DENKI KK
  • US20210134683A1 patent drawing
  • US20210134683A1 patent drawing
  • US20210134683A1 patent drawing

AI summary

Described herein is a technique capable of stabilizing conditions in a furnace at the start of a film-forming process. According to one aspect of the technique, there is provided a method of manufacturing a semiconductor device, including: pre-processing of preparing a process environment in a process furnace of a substrate processing apparatus; film-forming by processing a substrate; and post-processing, wherein the pre-processing comprises (a1) determining whether to execute a maintenance recipe for a target object in the substrate processing apparatus, wherein (a1) is performed first in the pre-processing.