Furnace Opening Shutter Shielding for Corrosive Cleaning Gas

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Solution Overview

Problem

The corrosion of furnace opening shutters due to the use of highly corrosive cleaning gases during the dry etching process for removing deposits in substrate processing apparatuses is a significant issue, as it compromises the integrity and functionality of the apparatus.

Innovation Solution

Incorporation of a protective cover and a lid structure for the furnace opening shutter, with a purge gas supply system to prevent corrosive gases from reaching the shutter, and a cooling water system to maintain the shutter within a specific temperature range, thereby reducing corrosion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a dry cleaning process using highly corrosive etching gas is used to remove deposits from the process chamber, then the cleaning effectiveness is improved, but the furnace opening shutter is corroded

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidcorrosion of furnace opening shutter

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A protective cover is introduced as an intermediary component between the corrosive etching gas and the furnace opening shutter. The protective cover is positioned to extend beyond the shutter in the radial direction, creating a physical barrier that prevents direct contact between the corrosive gas and the shutter, thereby resolving the contradiction by protecting the shutter while maintaining cleaning effectiveness

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

A purge gas flow is introduced to create an inert protective atmosphere around the furnace opening shutter. The purge gas flows in the radial direction to form a gas barrier that prevents corrosive etching gas from reaching the shutter, allowing the shutter to remain protected while the cleaning process continues effectively

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

2Productivity

If the furnace opening shutter is exposed to corrosive cleaning gases, then the cleaning process can be performed, but the lifespan and integrity of the shutter deteriorate

Engineering Contradiction:

Improvecleaning process capabilityVSAvoidshutter lifespan

Core Design Contradiction:

ProductivityVSDuration of action of stationary object

Solution Approach 1:

The protective cover serves as a mediator that enables the cleaning process to proceed while simultaneously protecting the shutter from corrosive damage. By positioning the protective cover to extend beyond the shutter radially, it creates a physical shield that allows aggressive cleaning gases to be used without compromising shutter lifespan

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The protective cover and purge gas system are activated before the corrosive cleaning gas is introduced. This preliminary protective action ensures that the shutter is already shielded when the cleaning process begins, preventing corrosion from occurring during the entire cleaning cycle and thereby extending shutter durability

Inventive Principle:

Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively minimizes corrosion of the furnace opening shutter, ensuring the apparatus's longevity and performance by isolating it from corrosive gases and maintaining optimal operating temperatures.

Implementation Method 1

a purge gas is supplied to a gap between the first sealing surface and the second sealing surface from a location radially more outward than the outer peripheral portion of the protective cover

Methodology Applied

Scientific EffectGas flow barrier: Convection

Implementation Method 2

a cooling water system to maintain the shutter within a specific temperature range

Methodology Applied

Scientific EffectThermal conduction: Conduction (thermal)

Data Source

PatentUS12398460B2Substrate processing apparatus, furnace opening assembly, substrate processing method, method of manufacturing semiconductor device and non-transitory tangible medium

Publication Date: 2025.08.26 KOKUSAI DENKI KK

AI summary

There is provided a technique capable of reducing a corrosion of a furnace opening shutter. According to one aspect thereof, a substrate processing apparatus includes: a process vessel provided with an opening and a first sealing surface around the opening; and a furnace opening shutter provided with a second sealing surface facing the first sealing surface, and capable of closing the opening. The furnace opening shutter includes: a protective cover provided corresponding to an inner surface of the furnace opening shutter, facing the process vessel and greater than the opening; and a lid provided corresponding to an outer surface of the furnace opening shutter and supporting the protective cover. The second sealing surface is configured by an outer peripheral portion of the protective cover and the lid, and a purge gas is supplied to a gap between the first sealing surface and the second sealing surface.