Fuse Latch Transistor Merging for Semiconductor Area Reduction

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Solution Overview

Problem

Existing semiconductor devices face challenges in efficiently arranging peripheral circuits for memory cells, which hinders regional integration and performance in high-speed electronic systems.

Innovation Solution

A fuse latch design incorporating specific configurations of NMOS and PMOS transistors, arranged in active regions to optimize data transmission and latching, allowing for improved regional gain by sharing signal and power lines between adjacent units.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of moving object

If traditional fuse latch designs are used, then the circuit functionality is maintained, but the device width and area increase

Engineering Contradiction:
Improvedevice widthVSAvoidtransistor arrangement complexity
Core Design Contradiction:
Area of moving objectVSDevice complexity

Solution Approach 1:

The patent merges multiple transistor functions into shared structures. Specifically, the first and second PMOS transistors share a common source region, and the third and fourth NMOS transistors share a common source region. This merging of components reduces the overall device width while maintaining the latch circuit's functionality.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent rearranges transistor connections to optimize spatial utilization. By configuring the PMOS transistors in parallel between VDD and intermediate nodes, and the NMOS transistors in a complementary arrangement, the design achieves compact width without sacrificing latching capability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If more transistors are used to ensure reliable latching, then the latching reliability improves, but the device area increases

Engineering Contradiction:
Improvelatching reliabilityVSAvoidperipheral circuit area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The latch circuit uses four transistors (2 PMOS, 2 NMOS) with shared source regions to achieve reliable latching. The first PMOS and second PMOS share a common source connected to VDD, while the third NMOS and fourth NMOS share a common source connected to ground. This merging reduces the peripheral circuit area while maintaining robust latching through the cross-coupled inverter structure.

Inventive Principle:
Principle #5Merging (Combining)

3Productivity

If fuse-related circuits are arranged traditionally, then the repair functionality is maintained, but the regional gain decreases

Engineering Contradiction:
Improveregional gainVSAvoidcircuit arrangement complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The fuse latch circuit achieves improved regional gain by merging the latching function with compact transistor arrangements. The shared source regions between PMOS and NMOS transistors reduce the area occupied by fuse-related circuits, allowing more efficient packing within the semiconductor device region.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The latch circuit is segmented into distinct functional blocks: the first inverter formed by the first PMOS and third NMOS, and the second inverter formed by the second PMOS and fourth NMOS. This segmentation allows for systematic arrangement and optimization of fuse-related circuits to improve regional gain.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20200090774A1Fuse latch of semiconductor device
Publication Date: 2020.03.19 SK HYNIX INC
  • US20200090774A1 patent drawing
  • US20200090774A1 patent drawing
  • US20200090774A1 patent drawing

AI summary

A fuse latch of a semiconductor device is disclosed. The fuse latch includes a plurality of PMOS transistors and a plurality of NMOS transistors to latch fuse cell data. In the fuse latch, the PMOS transistors are formed in a single P-type active region, and the NMOS transistors are arranged in a two-stage structure at one side of the P-type active region.