Fused Ring Aromatic Photoresist Resolution
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Solution Overview
Problem
Traditional high-molecular chemically amplified photoresists suffer from low resolution and poor line edge roughness due to large molecular weight and uneven distribution, which restricts the performance of integrated circuits in lithography.
Innovation Solution
A novel molecular glass photoresist is developed using a fused ring aromatic hydrocarbon as the central core, which includes specific derivatives and a preparation method involving reactions with leaving groups in organic solvents, resulting in a negative chemically amplified photoresist with improved resolution and contrast.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional high-molecular chemically amplified photoresist is used, then sensitivity is improved through acid-sensitive group deprotection, but resolution deteriorates due to large molecular weight and uneven distribution
Solution Approach 1:
The patent changes the molecular weight parameter from high-molecular to small-molecular range, and modifies the distribution parameter from uneven to monodisperse. This is achieved by using small molecular compounds with controlled molecular weights (e.g., C9-40 aromatic hydrocarbons) as host materials, which simultaneously maintains sensitivity through chemically amplified mechanisms while improving resolution through uniform size distribution and reduced molecular weight effects.
Solution Approach 2:
The patent creates a composite photoresist system combining small molecular host materials with acid-sensitive groups and photoacid generators. This composite approach integrates the advantages of small molecules (monodispersity, controlled MW) with the chemical amplification mechanism, achieving both high sensitivity and high resolution that neither component could achieve alone.
2Stability of the object's composition
If small molecular compound with high glass transition temperature is used as host material, then monodispersity and molecular weight control are improved, but film-forming properties and thermal stability need enhancement
Solution Approach 1:
The patent optimizes the glass transition temperature parameter to a specific range (e.g., Tg of 80-150°C) rather than simply maximizing it. This parameter optimization balances monodispersity benefits with film-forming capabilities, ensuring the material remains processable while maintaining compositional stability and uniform distribution.
Solution Approach 2:
The patent introduces specific functional groups (acid-sensitive groups, aromatic hydrocarbon cores) at localized positions within the small molecular structure. This local quality enhancement provides specific interactions that improve film-forming properties and thermal stability without compromising the overall monodispersity achieved through small molecular design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The fused ring aromatic hydrocarbon-based photoresist achieves high resolution, sensitivity, and thermal stability, with excellent film-forming properties and etching resistance, suitable for advanced lithography technologies like UV and EUV lithography.
Implementation Method 1
a chemically amplified photoresist enables acid-sensitive groups in the material to perform deprotection or crosslinking reactions through acids generated by decomposing a photoacid generator
Implementation Method 2
The compound has the characteristics of high melting point and high boiling point, and is more suitable for being a core structure of the molecular glass photoresist due to the conjugation of a plurality of benzene rings
Implementation Method 3
The molecular glass photoresist taking the fused ring aromatic hydrocarbon as the center has a relatively high melting point and thermal stability as well as more ideal etching resistance
Data Source
AI summary
A negative chemically amplified photoresist of a fused ring aromatic hydrocarbon derivative, a preparation method therefor, and use thereof are provided. A matrix component in the photoresist is a fused ring aromatic hydrocarbon derivative represented by general formula (I) that can be dissolved in organic solvents commonly used in photoresists. The photoresist composition of the present disclosure can be prepared to give a uniform film, and a molecular glass serving as the matrix component is not precipitated in the film preparation process.