Hot Dip Galvanization Adhesion Control Using Pre-Calculated Valve Lookup
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional devices for controlling hot dip galvanization adhesion face challenges in achieving high control accuracy and fast response speed, leading to variations in the amount of galvanization and prolonged operation times, especially when controlling gas pressures at high or low values.
Innovation Solution
A device with a computation processing unit that calculates and adjusts valve opening degrees for first and second valves to maintain set gas pressures and a constant total gas flow rate, using CV coefficients and characteristic functions to optimize gas flow and pressure control, thereby enhancing control accuracy and response speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If feedback control is used to control gas pressure, then control accuracy is improved, but response speed deteriorates due to valve sensitivity changes at high and low pressure values
Solution Approach 1:
The patent pre-calculates and stores the relationship between valve opening degrees and gas pressures in a table before actual operation. During control, the system simply looks up the pre-calculated values rather than performing real-time feedback calculations, thereby achieving both high control accuracy and fast response speed without the sensitivity issues of feedback control
2Measurement precision
If series arrangement of pressure control valve and opening control valve is used, then control accuracy is improved, but device complexity increases
Solution Approach 1:
The patent extracts the complex feedback control logic and replaces it with a simple table lookup mechanism. The detailed pressure-control-valve-and-opening-control-valve series arrangement is replaced by a single valve controlled by pre-stored opening degree data, thereby maintaining control accuracy while significantly reducing device complexity
Solution Approach 2:
The patent creates a pre-calculated table that copies the complex relationship between valve openings and gas pressures into a simple lookup structure. This table serves as a simplified model that reproduces the behavior of the complex series valve arrangement without requiring the actual complex hardware
3Device complexity
If conventional control method is used, then device complexity is maintained, but productivity deteriorates due to prolonged operation time for changing galvanization amount
Solution Approach 1:
The patent pre-calculates all necessary valve opening degrees for different gas pressure requirements and stores them in a table. When production requirements change, the system instantly retrieves the pre-calculated values without waiting for feedback control adjustments, thereby dramatically reducing operation time and improving productivity while keeping the device structure simple
Data Source
Figure 1
Figure 2
Figure 3
AI summary
The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1') of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23) ; a first valve aperture setter (13) that sets the valve aperture of the first valve (17) ; a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1') matches a set gas pressure (PI), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.