Galvano Scanner Waveform Control for Complex Laser Locus Patterns
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Solution Overview
Problem
Current laser processing machines are limited to vibrating laser beams in specific locus patterns, primarily sine wave shapes, restricting the ability to create complex patterns on sheet metals, and lack a method to control scan mirrors in arbitrary waveform shapes.
Innovation Solution
A coordinate pattern file creation device and locus pattern creation device that allow for the simulation and creation of coordinate patterns for vibrating laser beams in arbitrary waveform shapes, enabling the control of laser processing machines to process sheet metals with varied and complex patterns by controlling the galvano scanner unit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If scan mirrors are vibrated in sine wave shape, then smooth movement of scan mirrors is achieved, but laser beam vibration is limited to specific locus patterns only
Solution Approach 1:
The patent applies dynamics by transitioning from fixed sine wave vibration to dynamic arbitrary waveform vibration. The drive unit is configured to vibrate scan mirrors according to arbitrary waveforms that can be changed over time, allowing the system to adapt to different processing requirements while maintaining smooth movement through controlled acceleration and deceleration phases in each waveform cycle.
Solution Approach 2:
The patent implements parameter changes by modifying the vibration waveform parameters (amplitude, frequency, shape) of the scan mirrors. The drive unit can change vibration parameters dynamically to generate different locus patterns (circular, 8-shaped, C-shaped, etc.) from the same hardware configuration, eliminating the need for physical reconfiguration.
2Reliability
If galvano scanner unit is used with sine wave vibration, then reliable and smooth operation is achieved, but ability to create complex patterns on sheet metal is restricted
Solution Approach 1:
The system maintains reliability through dynamic waveform control where each arbitrary waveform includes controlled acceleration and deceleration phases. This ensures smooth operation while the arbitrary waveform shapes enable complex pattern creation that sine waves cannot achieve.
3Adaptability or versatility
If arbitrary waveform vibration is implemented, then various locus patterns can be created, but control method complexity increases
Solution Approach 1:
The drive unit is designed as a universal controller that can generate any arbitrary waveform through software control rather than requiring different hardware configurations. This multi-functional approach allows the same device to create all locus patterns (circular, 8-shaped, C-shaped, custom patterns) without adding physical complexity.
4Device complexity
If sine wave vibration is used, then simple control is maintained, but processing efficiency and pattern diversity are limited
Solution Approach 1:
The system achieves improved productivity through parameter changes in the vibration waveforms. By modifying waveform shape, amplitude, and frequency parameters, the system can optimize processing efficiency for different materials and patterns while maintaining a relatively simple control architecture based on programmable arbitrary waveform generation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the creation of complex locus patterns on sheet metals, allowing for more precise and versatile laser processing by vibrating the laser beam in arbitrary waveform shapes, improving processing efficiency and pattern complexity.
Implementation Method 1
vibrating the laser beam in an arbitrary waveform shape to process the sheet metal
Data Source
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AI summary
An interpolation parameter calculation unit (203) calculates an interpolation parameter of a predetermined interpolation calculation formula based on a first plurality of coordinate values input by means of a coordinate input unit (201) and constituting a coordinate pattern for determining a locus pattern of one cycle when a laser beam is vibrated. A locus pattern calculation unit (204) calculates a second plurality of coordinate values constituting the locus pattern based on an interpolation parameter, respective amplitudes of the locus pattern in an x-axis direction that is a moving direction of a processing head and a y-axis direction that is a direction orthogonal to the x-axis direction, a frequency of the locus pattern, and a control cycle of a beam vibration mechanism for vibrating the laser beam.