GaN Power Device Protruding Structures for High Voltage
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Solution Overview
Problem
Conventional silicon-based semiconductor devices face limitations in high-power and high-frequency applications due to large leakage currents, while gallium nitride power devices offer superior electrical parameters but require a balance between voltage withstand capability and process complexity and cost, especially in achieving high voltage with a larger device area.
Innovation Solution
A gallium nitride power device with a substrate, cathodes, gallium nitride protruding structures, an electron transport layer, and second conductivity type regions is designed, where the electron transport layer forms a conductive channel with higher mobility than the gallium nitride layer, and the structure is optimized to achieve high voltage withstand capability with reduced on-resistance and process complexity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a longitudinal-structure gallium nitride JBS device is used to achieve high voltage withstand capability, then the voltage withstand capability is improved, but the process cost increases
Solution Approach 1:
The patent transitions from conventional planar structures to a three-dimensional protruding structure configuration. The gallium nitride protruding structures extend vertically from the substrate surface, creating multiple conductive channels in the vertical dimension. This dimensional change enables high voltage withstand capability through increased breakdown voltage of the protruding structure configuration, while the lateral footprint remains compact, reducing the need for large device areas and associated process costs.
Solution Approach 2:
The device is segmented into multiple discrete gallium nitride protruding structures arranged in an array on the substrate. Each protruding structure acts as an independent conductive channel with its own Schottky barrier diode junction. This segmentation allows the total current capacity to be distributed across multiple parallel channels, achieving high voltage withstand capability through the collective behavior of segmented structures rather than requiring a single large-scale structure.
2Ease of manufacture
If a horizontal-structure gallium nitride JBS device is used to reduce process cost, then the process cost is reduced, but the voltage withstand capability is limited by horizontal size requiring larger device area
Solution Approach 1:
The patent resolves this contradiction by utilizing the vertical dimension through protruding structures that extend upward from the substrate. This vertical configuration enables the device to achieve high voltage withstand capability without proportionally increasing the horizontal device area. The protruding structures create extended conduction paths in the vertical direction, maintaining cost-effectiveness through smaller lateral footprints while achieving the required voltage ratings.
Solution Approach 2:
The patent applies local quality by creating regions of high electron mobility specifically at the protruding structure locations where the electron transport layer is positioned. The protruding structures concentrate the conductive channels in specific local regions with optimized material composition and structure, while other regions of the device can use standard configurations. This localized optimization achieves high performance in critical areas without requiring the entire device to be complex and expensive.
3Reliability
If an electron transport layer with higher electron mobility is introduced to reduce on-resistance, then the on-resistance is reduced, but the device structure and process complexity increase
Solution Approach 1:
The electron transport layer with superior electron mobility characteristics is selectively positioned only in the critical conduction channel regions where it is most needed - specifically at the protruding structure locations and interface regions. This localized application of high-performance materials reduces on-resistance in the most critical current paths without requiring the entire device structure to be complex. Standard gallium nitride layers are used in non-critical regions, simplifying the overall manufacturing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device achieves a balance between voltage withstand capability and device area, reducing on-resistance and process complexity, enabling efficient high-power applications with improved electron mobility and reduced leakage paths.
Implementation Method 1
an electron transport layer, covering a top portion and side surfaces of each of the gallium nitride protruding structures; a gallium nitride layer having the first conductivity type, arranged on the electron transport layer and filling each of the grooves, where the electron transport layer is configured to form a conductive channel region at a position where the electron transport layer is arranged, and an electron mobility of the conductive channel region is higher than that of the gallium nitride layer
Implementation Method 2
A junction barrier Schottky barrier diode (JBSBD) device combines the advantages of PiN diode (a diode with a P-I-N structure consisting of a low-doped intrinsic semiconductor layer added between P-type and N-type semiconductor materials) and a Schottky barrier diode (SBD), which not only has the advantages of high breakdown voltage and low leakage current of the PiN diode, but also achieves the fast switching speed of the SBD
Data Source
AI summary
A gallium nitride power device, including: a gallium nitride substrate; cathodes; a plurality of gallium nitride protruding structures arranged on the gallium nitride substrate and between the cathodes, a groove is formed between adjacent gallium nitride protruding structures; an electron transport layer, covering a top portion and side surfaces of each of the gallium nitride protruding structures; a gallium nitride layer, arranged on the electron transport layer and filling each of the grooves; a plurality of second conductivity type regions, where each of the second conductivity type regions extends downward from a top portion of the gallium nitride layer into one of the grooves, and the top portion of each of the gallium nitride protruding structures is higher than a bottom portion of each of the second conductivity type regions; and an anode, arranged on the gallium nitride layer and the second conductivity type regions.


