Gallium-Oxygen-Hydrogen Surface Layer for Photoreceptor Cracking

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Solution Overview

Problem

Electrophotographic photoreceptors face issues with mechanical endurance and oxidation resistance due to cracking caused by differences in mechanical properties and thermal expansion between the surface and underlying layers, especially under high temperature and humidity conditions, leading to image defects and damage.

Innovation Solution

A surface layer composed of 90% or more by atom of gallium (Ga), oxygen (O), and hydrogen (H) with an atomic number density of 7.8×10^22 cm^-3 or more is used, formed through plasma chemical vapor deposition, to enhance bonding strength and flexibility, preventing cracking and peeling.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a surface layer is added to the photoreceptor, then oxidation resistance is improved, but cracking occurs due to mechanical property differences

Engineering Contradiction:
Improveoxidation resistanceVSAvoidcracking resistance
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

The invention changes the compositional parameters of the surface layer by specifying precise proportions of Ga, O, and H atoms (90% or more by atom) and controlling the atomic number density (7.8×10^22 cm^-3 or more). These parameter changes optimize both oxidation resistance and mechanical flexibility to prevent cracking.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite surface layer combining gallium, oxygen, and hydrogen in specific ratios. This composite structure provides both oxidation resistance from the Ga-O network and flexibility from the H-containing bonds, resolving the contradiction between protection and cracking resistance.

Inventive Principle:
Principle #40Composite materials

2Reliability

If the surface layer is made harder to resist oxidation, then oxidation resistance is improved, but mechanical endurance deteriorates

Engineering Contradiction:
Improveoxidation resistanceVSAvoidmechanical endurance
Core Design Contradiction:
ReliabilityVSDuration of action of stationary object

Solution Approach 1:

The invention optimizes the atomic composition parameters (Ga:O:H ratio ≥90% by atom) and density parameters (≥7.8×10^22 cm^-3) to achieve a surface layer that maintains both hardness for oxidation resistance and flexibility for mechanical endurance under repeated contact stresses.

Inventive Principle:
Principle #35Parameter changes

3Adaptability or versatility

If the photoreceptor is used under high temperature and humidity conditions, then operational flexibility is improved, but cracking increases due to thermal expansion differences

Engineering Contradiction:
Improveoperational flexibilityVSAvoidcracking resistance
Core Design Contradiction:
Adaptability or versatilityVSStrength

Solution Approach 1:

The invention adjusts the surface layer's physical parameters (compositional ratio of Ga, O, H and atomic density) to match the thermal expansion characteristics of the underlying layers, reducing thermal stress during temperature cycling in high-temperature humid environments.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention applies local quality modification by creating a surface layer with specifically controlled properties (90%+ Ga-O-H by atom, ≥7.8×10^22 cm^-3 density) that differs from the bulk material, optimizing this local region to withstand thermal and mechanical stresses.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The surface layer with specific elemental composition and density improves mechanical endurance and oxidation resistance, suppressing image defects and maintaining these characteristics over time, even under stressful conditions.

Implementation Method 1

formed through plasma chemical vapor deposition

Methodology Applied
Scientific EffectPlasma chemical vapor deposition: Plasma Enhanced Chemical Vapour Deposition

Data Source

PatentUS8404415B2Electrophotographic photoreceptor, and process cartridge and image forming apparatus using the same
Publication Date: 2013.03.26 FUJIFILM BUSINESS INNOVATION CORP
  • US8404415B2 patent drawing
  • US8404415B2 patent drawing
  • US8404415B2 patent drawing

AI summary

Disclosed is an electrophotographic photoreceptor including: an electroconductive substrate; a photosensitive layer arranged on or above the electroconductive substrate; and a surface layer arranged on or above the photosensitive layer, and containing about 90% or more by atom of gallium (Ga), oxygen (O) and hydrogen (H), and having an atomic number density of about 7.8×1022 cm−3 or more.