Gas Agitation for Rapid Dilution in Sample Processing Chips
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Solution Overview
Problem
Existing sample processing methods using thermal convection for dilution are time-consuming and can alter the target component due to heat, necessitating a more efficient agitation technique.
Innovation Solution
Introducing gas into the reservoir of a sample processing chip to mix the processing liquid and diluent, eliminating the need for heating and significantly reducing agitation time, while maintaining the integrity of the target component.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If thermal convection is used to agitate the processing liquid and diluent, then the target component can be diluted to a high dilution ratio, but the agitation time is excessively long
Solution Approach 1:
The patent applies pneumatic agitation by introducing gas bubbles into the processing liquid through a gas introduction port. The gas bubbles rise through the liquid, creating vigorous mixing and agitation that achieves high dilution ratios in significantly shorter time compared to thermal convection. This pneumatic method directly addresses the time-consuming nature of thermal convection while maintaining effective mixing.
2Quantity of substance
If thermal convection is used to agitate the processing liquid, then dilution can be achieved, but the target component may undergo heat-induced changes
Solution Approach 1:
The patent replaces thermal convection with pneumatic agitation using gas bubbles. This eliminates the need for heating the processing liquid, thereby preventing heat-induced changes to the target component while still achieving the required high dilution ratio through mechanical mixing action of the rising gas bubbles.
Solution Approach 2:
The patent substitutes the thermal field (heating) with a mechanical field (gas bubble agitation). By using gas introduction to create physical mixing rather than thermal convection, the system achieves dilution without exposing the target component to harmful heat effects.
3Device complexity
If the reservoir is provided directly in the substrate of the sample processing chip, then integration is improved, but the cross sectional area for gas passage is reduced hindering effective agitation
Solution Approach 1:
The patent segments the reservoir structure from the substrate, creating a separate reservoir that can be optimally designed for gas passage. This segmentation allows the reservoir to have a larger cross-sectional area specifically optimized for gas bubble agitation, while still maintaining integration with the substrate through connection structures. The separation enables independent optimization of gas passage characteristics.
Solution Approach 2:
The patent positions the gas introduction port at the bottom of the reservoir, utilizing the vertical dimension for gas passage. This dimensional arrangement allows gas bubbles to rise through the maximum height of the liquid column, maximizing mixing efficiency. The reservoir's cross-sectional area in the horizontal plane can be independently optimized for adequate gas flow while maintaining substrate integration.
Data Source
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AI summary
A sample processing method comprises storing a processing liquid (11) containing a target component (10) and a diluent (12) for diluting the processing liquid (11) in a reservoir (110) of a sample processing chip (100), and agitating the processing liquid (11) and the diluent (12) in the reservoir (110) by introducing a gas into the reservoir (110). The processing liquid (11) is diluted in order to prepare a droplet forming sample (13) for forming droplets (14) individually encapsulating the target component (10).