Gas Amplifier Reactant Removal for Substrate Chamber
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Solution Overview
Problem
Current substrate processing systems face inefficiencies in cooling and reactant removal from the processing chamber prior to maintenance, with existing methods taking several hours and leaving the chamber partially open, which prolongs downtime and may not completely remove reactants.
Innovation Solution
A cooling and reactant removal system utilizing a gas amplifier with a Coanda surface to draw large volumes of compressed gas through the chamber, combined with a scrubbed exhaust system and optional humidity supply, which accelerates cooling and reactant removal by enhancing conductive cooling and facilitating the evacuation of reactants.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If traditional venting and pumping methods are used to remove reactants and cool the chamber, then the process is simple to operate, but the downtime is excessively long (several hours)
Solution Approach 1:
The patent employs a gas amplifier that uses compressed gas (pneumatic power) to generate a high-velocity jet flow through a Coanda surface. This jet induces large volumes of chamber gas to be drawn through the processing chamber at accelerated rates, replacing the slow traditional vacuum pumping method with a high-speed pneumatic flow system that reduces cooling and purging time from hours to minutes.
Solution Approach 2:
The system changes the flow rate parameter of gas through the chamber by using the gas amplifier to create a high-velocity jet that induces supersonic or near-supersonic flow rates. This parameter change from slow vacuum pumping to high-speed gas flow dramatically accelerates the cooling and reactant removal processes while maintaining operational simplicity through automated control.
2Reliability
If the chamber is vented to atmosphere using ambient air, then reactant removal is achieved, but complete reactant removal is not ensured and the chamber must be left partially open
Solution Approach 1:
The patent introduces an inert gas (such as nitrogen or clean dry air) through the gas amplifier system to displace and flush reactants from the chamber. This creates an inert atmosphere that ensures complete reactant removal while allowing the chamber to remain sealed, eliminating the need to leave the chamber partially open and improving both safety and operational convenience.
Solution Approach 2:
The gas amplifier acts as an intermediary device that mediates between the compressed gas source and the chamber interior. It amplifies the gas flow to create a powerful flushing action that ensures complete reactant removal without requiring direct chamber opening, thus maintaining ease of operation while achieving reliable purging.
3Productivity
If compressed gas is used to accelerate cooling and reactant removal, then the process speed increases significantly, but the system complexity increases due to additional components
Solution Approach 1:
The gas amplifier system serves multiple functions simultaneously: it accelerates chamber cooling, removes reactants, and can be integrated with existing vacuum and venting systems. This multi-functionality allows a single added component to address multiple process requirements, improving productivity without proportionally increasing overall system complexity.
Solution Approach 2:
The gas amplifier system is designed to be self-regulating and easily integrated into existing chamber configurations. The compressed gas source drives the entire process without requiring additional complex control systems, and the system automatically adjusts flow rates based on chamber conditions, reducing the operational burden and effective complexity despite adding hardware components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This system significantly reduces downtime by accelerating the cooling and reactant removal process, potentially from 6 hours to less than 2 hours, and can be retrofitted onto existing systems, ensuring thorough reactant removal and efficient maintenance preparation.
Implementation Method 1
A gas amplifier has a first inlet, a second inlet, an outlet and at least one Coanda surface. The first inlet of the gas amplifier is in fluid communication with a compressed source of gas. The compressed gas received at the first inlet is directed across the Coanda surface.
Data Source
AI summary
A cooling and reactant removal system includes first and second gate valves. An outlet of the first gate valve is arranged in fluid communication with the process volume of the processing chamber. A filter is arranged in fluid communication with an inlet of the first gate valve. An inlet of the second gate valve is arranged in fluid communication with the process volume of the processing chamber. A gas amplifier has a first inlet, a second inlet, an outlet and at least one Coanda surface. Compressed gas received at the first inlet of the gas amplifier is directed across the Coanda surface. The second inlet of the gas amplifier is in fluid communication with the outlet of the second gate valve. The outlet of the gas amplifier is in fluid communication with a scrubbed exhaust system.