Gas Supply Member Baffle for Uniform Slit Valve Flow
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Variations in the shape or condition of slit valve doors in processing systems for manufacturing integrated circuits lead to non-uniform gas flow pathways, affecting deposition uniformity during substrate processing.
Innovation Solution
A gas supply member with a baffle structure that directs process gases towards the substrate, providing a uniform flow pathway by extending between sides and featuring protrusions and holes to stabilize gas flow, ensuring consistent deposition across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a generic rectangular opening is used in the processing chamber, then the device complexity is reduced, but the deposition uniformity deteriorates due to mismatch with the slit valve
Solution Approach 1:
A slit valve insert is introduced as an intermediary component between the generic rectangular opening and the slit valve. This insert acts as an adapter that matches the slit valve geometry, ensuring proper gas flow pathways and deposition uniformity without requiring modification of the main processing chamber structure.
Solution Approach 2:
The gas supply system is segmented into multiple components: the processing chamber with generic opening, the removable slit valve insert, and the slit valve itself. This segmentation allows the insert to be optimized for gas flow while keeping the main chamber structure simple and reusable.
2Ease of operation
If the slit valve door becomes dirty or contaminated during opening and closing cycles, then the ease of operation is maintained, but the deposition uniformity deteriorates due to changes in gas flow pathway
Solution Approach 1:
The slit valve insert serves as a protective intermediary that can be easily removed and cleaned or replaced. It absorbs the contamination issues during valve operation, preventing direct contact between contaminants and the substrate gas flow pathway, thereby maintaining deposition uniformity despite frequent valve cycling.
Solution Approach 2:
The slit valve insert is designed as a consumable or easily replaceable component that can be cleaned or replaced when contaminated, rather than requiring cleaning or replacement of the entire slit valve assembly or processing chamber.
3Productivity
If process gases enter at high velocity through the gas inject, then the productivity is improved through faster deposition, but the deposition uniformity deteriorates due to momentum carrying gases away from substrate
Solution Approach 1:
The baffle structure redirects the high-velocity gas flow from a direct linear path into a three-dimensional pattern within the tunnel. The gas flow is channeled along the tunnel walls and distributed across multiple dimensions before reaching the substrate, converting high linear momentum into distributed radial flow that improves uniformity while maintaining high deposition rates.
Solution Approach 2:
The gas flow pathway is segmented by the baffle into multiple sub-streams that travel along different paths within the tunnel before converging at the substrate. This segmentation distributes the high-velocity flow into controlled segments, preventing direct impact while maintaining overall flow rate and deposition speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The baffle structure ensures uniform and consistent gas flow, enhancing deposition uniformity and allowing for higher gas flow rates without flow non-uniformities, thereby improving deposition rates and quality.
Implementation Method 1
The gas flows from the gas inject to the tunnel and towards the substrate
Implementation Method 2
The first extension includes a first plurality of holes extending through the first extension to the face
Implementation Method 3
The baffle structure ensures uniform and consistent gas flow, enhancing deposition uniformity
Data Source
AI summary
A gas supply member includes a first side opposite a second side and an inner surface defining a first opening extending between the first and second sides. The gas supply member includes a third side orthogonal to the first side, the third side includes a first extension that has a face partially defining the second side, and the first extension includes a first plurality of holes extending through the first extension to the face. The gas supply member includes a fourth side opposite the third side, the fourth side includes a protrusion that has a face partially defining the second side. The gas supply member also includes a baffle disposed adjacent to the inner surface, the baffle includes a first portion extending from the inner surface and a second portion attached to the first portion, and the second portion orthogonal to the first portion and parallel to the third side.