Gas Box Pressure Biasing for High-Temperature Leak Ignition Control
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Solution Overview
Problem
High-pressure processing of semiconductor wafers poses a risk of gas leaks leading to ignition due to increased temperatures, especially when the processing temperature approaches or exceeds the spontaneous ignition temperature of the gases used, risking contamination and fire in the gas box assembly.
Innovation Solution
A gas box assembly for high-pressure processing apparatuses that includes a housing with a supply module, an exhaust module, and a charge module that introduces a protection gas at a pressure higher than external pressure to prevent external air ingress, along with a detection and control module to manage pressure and gas leaks, ensuring the inner space maintains a pressure biased towards external pressure and includes a discharge module to dilute leaking gases.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high pressure processing is performed at high temperature, then processing efficiency is improved, but the risk of gas ignition due to leakage increases
Solution Approach 1:
The patent applies preliminary anti-action by pre-charging the gas box with protection gas before the processing operation begins. This creates a protective atmosphere in advance that prevents oxygen from being present when high-temperature processing starts, thereby preventing ignition if process gas leaks occur during high-efficiency processing
Solution Approach 2:
The patent implements an inert atmosphere by filling the gas box with protection gas (such as nitrogen or argon) that displaces oxygen. This inert environment maintains safety during high-temperature processing by ensuring that even if process gas leaks, the absence of oxygen prevents combustion while processing efficiency is maintained
2Reliability
If protection gas is charged at high pressure to block external air, then safety against ignition is improved, but the pressure control complexity increases
Solution Approach 1:
The patent applies dynamics by using a pressure-regulating valve that automatically adjusts the protection gas pressure based on the chamber pressure conditions. The system dynamically maintains the pressure relationship where protection gas pressure is higher than external atmospheric pressure but lower than chamber pressure during processing, eliminating the need for complex manual pressure control while ensuring safety
Solution Approach 2:
The patent implements parameter changes by controlling the protection gas pressure to vary according to processing conditions. The pressure is set to be higher than external pressure to prevent air ingress during normal operation, and the system automatically adjusts parameters to maintain this relationship without requiring complex control mechanisms
3Reliability
If the inner space pressure is maintained biased toward external pressure, then prevention of external air ingress is improved, but the ability to contain high pressure process gas is reduced
Solution Approach 1:
The patent applies segmentation by dividing the pressure containment function into two separate zones: the gas box inner space and the processing chamber. The gas box maintains a pressure environment biased toward external pressure to prevent air ingress, while the chamber handles high-pressure process gas. This segmentation allows each zone to optimize its pressure characteristics independently
Solution Approach 2:
The patent uses protection gas as an intermediary substance that fills the gas box inner space. This intermediary creates a pressure buffer zone that prevents external air from reaching the chamber while allowing the chamber to maintain its own high-pressure process gas environment. The protection gas mediates between external atmosphere and process gas without requiring the gas box to withstand full process pressure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents ignition risks by maintaining a controlled environment within the gas box assembly, ensuring the protection gas dilutes any leaking process gases and maintains a safe oxygen concentration, thereby reducing the risk of fire and contamination during high-temperature processing.
Implementation Method 1
a charge module charging a protection gas into the inner space at a pressure higher than an external pressure of the housing to block external air from being introduced into the inner space
Implementation Method 2
The control module controls the charge module to charge the protection gas into the inner space to dilute the leaking gas during a discharge process of the gas from the inner space
Data Source
AI summary
Provided is a gas box assembly for a high pressure processing apparatus, the assembly including: a housing having an inner space; a supply module disposed in the inner space and supplying a process gas to a chamber of the high pressure processing apparatus; an exhaust module exhausting a gas occurring due to processing of an object in the chamber; and a charge module charging a protection gas into the inner space at a pressure higher than an external pressure of the housing to block external air from being introduced into the inner space.