Vacuum Processing Gas Diffuser Chamber Segmentation
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Solution Overview
Problem
In semiconductor manufacturing, the installation of a gas diffuser in vacuum processing apparatuses poses challenges such as foreign particle contamination, difficulty in maintenance, and contamination by ions and radicals in processing chambers, especially due to limited space and inability to clean the gas diffuser area effectively.
Innovation Solution
A vacuum processing apparatus with a dedicated gas diffuser chamber connected to the lock chamber, allowing for easy removal and cleaning, and installation of the gas diffuser between gate valves to prevent contamination and facilitate maintenance, reducing foreign particle occurrence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the lock chamber volume is minimized to reduce vent time and vacuuming time, then productivity is improved, but the gas diffuser cannot be accommodated with sufficient space leading to foreign particle contamination
Solution Approach 1:
The gas diffuser installation space is segmented from the lock chamber by providing a dedicated gas diffuser chamber that can be removably connected to the lock chamber. This segmentation allows the lock chamber to maintain minimal volume for fast venting and vacuuming, while the separate gas diffuser chamber provides sufficient space for proper gas diffuser accommodation and periodic cleaning, thereby preventing foreign particle contamination without compromising productivity
Solution Approach 2:
A dedicated gas diffuser chamber serves as an intermediary component between the lock chamber and the gas diffuser. This intermediate structure enables the gas diffuser to be properly installed and maintained in a separate space, preventing direct contamination of the lock chamber while maintaining the compact design of the lock chamber itself
2Device complexity
If the gas diffuser is installed directly in the lock chamber, then device complexity is reduced, but maintenance difficulty increases due to inability to clean the gas diffuser area
Solution Approach 1:
The gas diffuser chamber is segmented as a separate, removably connected component from the lock chamber. This segmentation allows the gas diffuser to be installed in a dedicated space that can be easily accessed for periodic cleaning and maintenance, while the overall device structure remains relatively simple
Solution Approach 2:
The gas diffuser chamber is designed to be removably connected to the lock chamber, providing dynamic accessibility for maintenance. This removable connection enables easy disassembly for cleaning the gas diffuser area during periodic wet cleaning, while maintaining a simple integrated structure during normal operation
3Reliability
If the gas diffuser is installed in the processing chamber to prevent foreign particle fly-off, then reliability is improved, but the gas diffuser becomes contaminated by ions and deposition radicals
Solution Approach 1:
The gas diffuser is extracted from the processing chamber environment and installed in the lock chamber or a dedicated gas diffuser chamber. This extraction removes the gas diffuser from exposure to corrosive ions and deposition radicals in the processing chamber, preventing contamination while maintaining its function of preventing foreign particle fly-off during venting operations
Solution Approach 2:
The lock chamber serves as an intermediary environment for the gas diffuser installation. This intermediate location provides protection from the harsh processing chamber conditions (ions and radicals) while still allowing the gas diffuser to perform its function of preventing foreign particle contamination during venting operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances maintenance ease and reduces foreign particle contamination by allowing periodic cleaning of the gas diffuser area and minimizing exposure to corrosive radicals, while optimizing venting and vacuuming times.
Implementation Method 1
a gas diffuser for venting the lock chamber
Data Source
AI summary
There is a vacuum processing apparatus which can reduce the amount of foreign particle occurrence by enhancing the ease of maintenance of a gas diffuser installing portion in the vacuum processing apparatus. A gas diffuser chamber for accommodating a gas diffuser is installed in the vacuum processing apparatus.