Gas Distribution Plate with Edge Ring Plenum for Uniform Flow
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Solution Overview
Problem
Current gas distribution apparatuses in semiconductor and display processing struggle to provide uniform supply of separate gases to processing chambers, particularly in advanced technologies with shrinking feature sizes and increasing aspect ratios, leading to non-uniform deposition and inefficiencies in vapor deposition processes.
Innovation Solution
The development of a gas distribution apparatus comprising a gas distribution plate with a spiral or linear gas delivery channel, featuring a plurality of apertures along its length, and an edge ring with a plenum and trenches, which allows for controlled vacuum pressure modulation to achieve uniform gas flow and rapid switching between different gases, minimizing dead spaces and enhancing gas conductance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional gas distribution apparatuses are used, then gas supply is provided to processing chambers, but uniform gas distribution is difficult to achieve leading to non-uniform deposition
Solution Approach 1:
The gas distribution apparatus is divided into multiple functional segments: a gas distribution plate with delivery channels and apertures for primary gas distribution, and an edge ring with a plenum chamber and additional apertures for edge region gas supply. This segmentation allows independent optimization of gas flow to different regions of the substrate, improving deposition uniformity across the entire substrate surface including edge regions.
Solution Approach 2:
The apparatus provides different gas distribution characteristics to different locations: the gas distribution plate covers the central substrate area with a specific aperture pattern, while the edge ring provides targeted gas supply to the substrate edge region through its own aperture arrangement. This local quality approach ensures uniform deposition across varying regional requirements.
2Adaptability or versatility
If multiple gases are used for various process reasons, then process functionality is enhanced, but uniform supply of separate gases becomes more difficult
Solution Approach 1:
The gas distribution system is segmented into multiple independent gas delivery paths: separate delivery channels in the gas distribution plate and a separate plenum chamber in the edge ring. Each segment can receive and distribute different gases independently, allowing multiple gases to be supplied uniformly without interfering with each other's distribution characteristics.
Solution Approach 2:
The gas distribution apparatus is designed with multi-functionality to handle various gas types and process requirements. The structure can accommodate different gas flows through its multiple channels and apertures, providing universal gas distribution capability while maintaining uniformity for each specific gas type used in the process.
3Productivity
If feature sizes are reduced and aspect ratios increased, then device density is improved, but conformal deposition becomes increasingly difficult to achieve
Solution Approach 1:
The gas distribution apparatus addresses conformal deposition requirements by providing locally optimized gas flow to different substrate regions. The edge ring with its plenum chamber specifically targets the edge regions where conformal coverage is most critical for high aspect ratio features, while the central gas distribution plate serves the bulk substrate area, ensuring uniform reactant distribution throughout.
Solution Approach 2:
The apparatus transitions from a single-plane gas distribution approach to a three-dimensional gas distribution system. The edge ring surrounds the gas distribution plate at an elevated position, creating a vertical dimension in gas supply. This multi-dimensional arrangement ensures gas reaches both central and edge regions of substrates with high aspect ratios, enabling conformal deposition throughout the entire substrate volume.
4Productivity
If rapid switching between different gases is required, then process efficiency is improved, but gas distribution control becomes more challenging
Solution Approach 1:
The gas distribution system is segmented into independent gas delivery paths with separate apertures and channels. Each segment can be independently controlled to switch between different gases rapidly. This segmentation allows different regions of the substrate to receive different gases simultaneously or sequentially without cross-contamination, simplifying the control of rapid gas switching operations.
Data Source
AI summary
Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.