Gas Distribution Unit for Substrate Processing
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Solution Overview
Problem
Existing substrate processing apparatuses suffer from reduced thin film uniformity due to centrifugal forces causing uneven deposition of thin films on substrates, particularly in the inner portions, leading to degraded substrate quality.
Innovation Solution
A substrate processing apparatus with a gas distribution unit comprising multiple modules that distribute different processing gases to distinct gas distribution spaces, allowing for time and space division processing modes to enhance gas distribution uniformity and prevent gas mixing, thereby improving thin film deposition uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single gas distribution module distributes processing gas to a substrate during rotation, then the device complexity is low, but the thin film deposition uniformity deteriorates due to centrifugal force causing thinner deposition in inner portions
Solution Approach 1:
The gas distribution unit is divided into multiple independent gas distribution modules (first, second, and third modules), each responsible for distributing different process gases (source gas, reactant gas, purge gas) to different gas distribution spaces. This segmentation allows independent control of gas flow to different regions of the substrate, compensating for centrifugal force effects and achieving uniform thin film deposition across the entire substrate surface.
2Productivity
If multiple gases are distributed simultaneously without spatial separation, then the processing efficiency is high, but gas mixing occurs causing particle formation and reduced substrate quality
Solution Approach 1:
Different process gases are distributed through separate gas distribution modules to distinct gas distribution spaces (first, second, and third spaces), preventing gas mixing during the distribution phase. This spatial segmentation maintains processing efficiency while avoiding particle formation caused by unwanted gas interactions.
Solution Approach 2:
Each gas distribution module is positioned and configured to distribute specific gases to specific regions or spaces within the processing chamber. The source gas, reactant gas, and purge gas are delivered to locally optimized zones, ensuring appropriate gas concentrations and compositions in each region without interference from other gases, thereby maintaining high substrate quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the uniformity of thin films deposited on substrates, improves substrate quality, and reduces particle formation during processing by minimizing gas mixing, leading to a more stable and efficient processing process.
Implementation Method 1
a centrifugal force based on the rotation of the substrate supporting unit 11 acts on the process gas distributed by the gas distribution unit 12
Data Source
AI summary
The present inventive concept relates to a gas distribution apparatus of a substrate processing apparatus including: a first gas distribution module distributing a processing gas to a first gas distribution space; and a second gas distribution module distributing a processing gas to a second gas distribution space which differs from the first gas distribution space, a substrate processing apparatus, and a substrate processing method.