Gas Distribution Unit with Segmented Injection Holes
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Solution Overview
Problem
Existing gas distribution apparatuses for substrate processing exhibit partial deviations in process gas distribution, leading to uneven deposition and increased processing time, which affects the quality and productivity of substrates.
Innovation Solution
A substrate processing apparatus with a process gas distribution unit featuring multiple injection holes and grooves in the chamber lid, including a first injection hole and a second injection hole at different positions, and first and second distribution holes with varying lengths and orientations, connected by branch grooves, to ensure uniform gas distribution across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-sided process gas supply is used, then the device complexity is reduced, but the manufacturing precision deteriorates due to partial deviation in gas distribution
Solution Approach 1:
The gas supply system is segmented into multiple independent injection holes (first injection hole, second injection hole) positioned at different locations. Each injection hole has its own branch grooves and distribution holes, allowing independent gas flow control to different regions of the substrate, thereby achieving uniform distribution without increasing overall system complexity
Solution Approach 2:
Different regions of the distribution body are designed with different local characteristics - the first and second injection holes are positioned at different locations, and each has branch grooves and distribution holes configured for its specific region. This local optimization ensures that gas is distributed uniformly across the entire substrate area, resolving the contradiction between simple structure and uniform distribution
2Manufacturing precision
If multiple injection holes and branch grooves are added, then the manufacturing precision is improved, but the device complexity increases
Solution Approach 1:
Multiple functional elements (injection holes, branch grooves, distribution holes) are merged into a single integrated distribution body. The first and second injection holes are both formed in the distribution body, with their respective branch grooves and distribution holes also integrated into the same component, achieving uniform gas distribution without requiring separate assemblies
Solution Approach 2:
The distribution body serves multiple functions simultaneously: it contains both first and second injection holes for gas entry, incorporates branch grooves for gas distribution pathways, and provides distribution holes for gas exit to the substrate. This multi-functionality in a single component achieves uniform gas distribution while minimizing the number of separate parts
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces partial deviations in gas distribution, enhancing the uniformity of thin film deposition, shortening processing time, and reducing gas consumption, thereby improving substrate quality and productivity while minimizing particle generation and deposition-related pollution.
Implementation Method 1
a process gas distribution unit installed in the chamber lid to distribute a process gas toward the substrate supporting unit
Data Source
AI summary
The present disclosure relates to a gas distribution apparatus for substrate processing apparatuses, including: a distribution body distributing a process gas toward a substrate supporting unit supporting a substrate; a first injection hole provided in the distribution body, a process gas which is to be distributed toward the substrate supporting unit being injected through the first inject hole; and a second injection hole provided in the distribution body at a position spaced apart from the first injection hole, a process gas which is to be distributed toward the substrate supporting unit being injected through the second inject hole, and a substrate processing apparatus.