Gas Distribution Valves with Distinct Flow Coefficients
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Solution Overview
Problem
Existing plasma processing systems for semiconductor structures face challenges in rapidly switching between different gas compositions and flow rates within a plasma processing chamber without causing pressure surges or flow instabilities, which affects the efficiency and uniformity of processing operations.
Innovation Solution
A gas distribution system with fast switching capabilities, utilizing multiple gas passages and valves with distinct flow coefficients to maintain equal inlet pressures during gas switching, allowing for quick changes between different gas compositions and flow rates to be supplied to the center and edge zones of a plasma processing chamber, thereby enabling rapid gas composition changes without pressure surges or flow instabilities.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas switching is performed rapidly between different gas compositions, then productivity is improved, but pressure surges and flow instabilities occur
Solution Approach 1:
The patent applies parameter changes by adjusting the flow coefficients of valves to different values. Specifically, the first valve has a first flow coefficient and the second valve has a second flow coefficient, where these coefficients are optimized to maintain equal inlet pressures during gas switching. This parameter optimization enables rapid gas composition changes while preventing pressure surges and flow instabilities.
2Loss of time
If gas flow rates are changed quickly, then processing time is reduced, but flow instabilities occur
Solution Approach 1:
The patent optimizes valve flow coefficients as key parameters to enable quick gas flow rate changes without causing flow instabilities. By carefully selecting and adjusting the flow coefficients of the switching valves, the system achieves fast processing time reduction while maintaining stable gas flow composition throughout the switching process.
3Manufacturing precision
If uniform gas distribution is achieved across chamber zones, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent divides the gas distribution system into multiple independent gas passages, each serving specific zones of the plasma processing chamber. This segmentation allows different gas compositions and flow rates to be supplied to different zones simultaneously, achieving uniform gas distribution across the chamber while managing complexity through modular passage design.
Solution Approach 2:
The patent implements local quality by providing different gas chemistries and flow rates to different zones (center and edge zones) of the plasma processing chamber. Each zone receives gas parameters optimized for its specific processing requirements, achieving manufacturing precision through localized gas property control.
Data Source
AI summary
A gas switching system for a gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus, is provided. The chamber can include multiple zones, and the gas switching section can supply different gases to the multiple zones. The switching section can switch the flows of one or more gases, such that one gas can be supplied to the chamber while another gas can be supplied to a by-pass line, and then switch the gas flows.