Layered Gas Purifying Filter for Trimethylsilanol Removal
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Solution Overview
Problem
Semiconductor manufacturing facilities face contamination issues due to low molecular weight silicon-based contaminants like trimethylsilanol, which are not effectively removed by general carbon-based filters, leading to lens hazing and reduced precision in photolithography processes.
Innovation Solution
A gas purifying filter comprising a first adsorption layer with activated carbon supported by a phosphoric acid-based compound and a second adsorption layer with hydrophobic zeolite, designed to efficiently remove low molecular weight silicon-based contaminants by chemical and physical adsorption, respectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If general carbon-based filters are used, then the filter structure is simple and cost-effective, but low molecular weight silicon-based contaminants like trimethylsilanol are not effectively removed
Solution Approach 1:
The filter is divided into multiple functional layers: a first adsorption layer containing activated carbon for general contaminant removal, and a second adsorption layer containing hydrophobic zeolite specifically for low molecular weight silicon-based contaminants. This segmentation allows each layer to specialize in removing specific types of contaminants, achieving comprehensive purification while maintaining reasonable structural complexity.
Solution Approach 2:
The filter combines different adsorption materials (activated carbon and hydrophobic zeolite) with distinct properties into a composite structure. The activated carbon provides broad-spectrum adsorption capacity while the hydrophobic zeolite specifically targets silicon-based contaminants through its hydrophobic pores, creating a synergistic effect that enhances overall contaminant removal effectiveness.
2Reliability
If multiple adsorption layers are added to remove specific contaminants, then contaminant removal effectiveness improves, but filter complexity and manufacturing difficulty increase
Solution Approach 1:
The filter utilizes porous materials (activated carbon and hydrophobic zeolite) that can be formed into discrete layers with controlled pore structures. These porous adsorbents are commercially available and can be incorporated into the filter through established manufacturing techniques, balancing the need for multiple functional layers with manufacturing feasibility.
Solution Approach 2:
The filter design changes the chemical and physical parameters of the adsorption materials to target specific contaminants. The hydrophobic zeolite layer is specifically selected with appropriate pore size and hydrophobicity parameters to adsorb low molecular weight silicon-based contaminants, while the activated carbon layer provides complementary adsorption capacity for other contaminants.
3Manufacturing precision
If the filter uses specialized adsorption materials for specific contaminants, then precision of contaminant removal improves, but filter cost increases
Solution Approach 1:
The filter applies local quality by placing specific adsorption materials in specific layers to address specific contaminant types. The hydrophobic zeolite is localized in the second adsorption layer specifically for silicon-based contaminant removal, while activated carbon is placed in the first layer for general contaminant adsorption. This localized application of specialized materials achieves precise contaminant removal without requiring all materials throughout the entire filter structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The filter effectively removes contaminants such as trimethylsilanol, improving the precision and efficiency of semiconductor manufacturing processes by preventing lens contamination and extending filter lifespan.
Implementation Method 1
a first adsorption layer disposed on the first gas permeable body and including activated carbon on which a phosphoric acid-based compound satisfying the following Formula 1 is supported
Implementation Method 2
a second adsorption layer disposed on the first adsorption layer and including a hydrophobic zeolite having a SiO2/Al2O3 value of about 50 or more
Data Source
AI summary
A gas purifying filter includes a first gas permeable body having a gas inlet surface; a first adsorption layer disposed on the first gas permeable body and including activated carbon on which a phosphoric acid-based compound satisfying the following Formula 1 is supported; a second adsorption layer disposed on the first adsorption layer and including a hydrophobic zeolite having a SiO2/Al2O3 value of about 50 or more; and a second gas permeable body disposed on the second adsorption layer and having a gas outlet surface,where n is an integer greater than or equal to 1.