Gas-Flow Substrate Suspension for Uniform Heating
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Solution Overview
Problem
Conventional substrate heating apparatuses cause damage and non-uniform heating due to physical contact and friction between the glass substrate and supporting pins, leading to hard collisions and temperature differences.
Innovation Solution
A substrate heating apparatus that uses a gas-flow supporting unit to suspend the substrate above the heating unit, eliminating physical contact and employing suction cups and stopper units for precise positioning, ensuring uniform heating without collision or friction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the glass substrate is supported on supporting pins in contact with the heating unit, then the substrate can be held in position for heating, but the substrate suffers collision and friction damage and experiences non-uniform heating
Solution Approach 1:
The patent introduces gas flow as an intermediary medium between the substrate and the heating unit. The gas flow suspends the substrate above the heating unit without physical contact, eliminating collision and friction damage while still enabling heating. The gas acts as a mediator that transfers thermal energy without mechanical contact.
Solution Approach 2:
The patent employs pneumatic principles by using gas flow to suspend and position the substrate. The gas flow provides both support and positioning functions, replacing mechanical contact with pneumatic suspension, thereby preventing substrate damage from friction and collision.
2Temperature
If the glass substrate is supported on supporting pins in contact with the heating unit, then the substrate can be held in position for heating, but temperature differences occur between contact portions and other portions
Solution Approach 1:
The gas flow serves as an intermediary that enables uniform heat distribution across the substrate surface. By suspending the substrate above the heating unit, the gas flow allows thermal energy to reach all portions of the substrate evenly, eliminating temperature differences between contact and non-contact areas.
Solution Approach 2:
The patent replaces the mechanical contact-based heating system with a pneumatic suspension system. This substitution eliminates the mechanical contact points that caused non-uniform heating, allowing for more uniform thermal distribution across the entire substrate surface through the intermediary gas flow.
3Ease of operation
If supporting pins are used to hold the substrate, then the substrate can be positioned during heating, but the structure becomes complex and substrate damage risk increases
Solution Approach 1:
The gas flow acts as a versatile intermediary that simultaneously provides substrate suspension, positioning, and protection functions. This single intermediary element replaces the complex mechanical supporting pin structure, simplifying the device while maintaining ease of substrate positioning and reducing damage risk.
Solution Approach 2:
The gas flow performs multiple functions: it suspends the substrate, positions it during heating, and protects it from damage. This multi-functional approach replaces the need for separate supporting pins and other mechanical components, reducing device complexity while maintaining operational ease.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution prevents substrate damage and ensures uniform heating by maintaining the substrate in suspension, reducing friction and temperature discrepancies, thus enhancing the quality of the heating process.
Implementation Method 1
a gas blower connected with the gas source, and a gas feeding channel connected with the gas blower... the gas blower blows a gas flow through the gas feeding channel
Implementation Method 2
The glass substrate is heated by the heating unit 3... ensuring uniform heating of the substrate
Implementation Method 3
a gas heater provided between the gas source and the gas blower... heats the gas flow before it reaches the substrate
Data Source
AI summary
A substrate heating apparatus includes: a heating chamber, as well as a heating unit and a suspension holding unit which are provided in the heating chamber. The heating unit is provided at the bottom of the heating chamber, and the suspension holding unit holds the substrate in suspension above the heating unit. The apparatus avoids collision and friction on the substrate, and ensures uniform heating of the substrate.