Gas Flow Verification Unit Pressure Temperature Control
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Solution Overview
Problem
Conventional gas flow rate verification units in semiconductor manufacturing processes have low reliability due to wide variations in flow rate control precision, leading to potential inaccuracies in measuring gas flow rates, which can affect the yield and safety of the process.
Innovation Solution
A gas flow rate verification unit is configured with a first and second cutoff valve, a pressure detector, a temperature detector, and a control device that calculates the flow rate using pressure and temperature data, ensuring uniform pressure between the valves and reducing the volume between them to enhance precision and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a conventional gas flow rate verification unit is used, then the flow rate can be measured, but the measurement precision is low due to wide variations in flow rate control precision
Solution Approach 1:
The patent changes the measurement parameter from direct flow rate measurement to pressure differential measurement. By measuring the pressure difference between upstream and downstream sides of the verification unit, the system achieves more precise and reliable flow rate verification without being affected by the limitations of conventional flow meters.
Solution Approach 2:
The patent introduces a pressure detector as an intermediary measurement tool. Instead of directly measuring flow rate, the system uses pressure differential detection as an intermediate step to indirectly and more accurately determine the flow rate, thereby improving measurement precision and reliability.
2Measurement precision
If flow rate verification is performed by removing a pipe section, then measurement can be conducted, but the operation becomes time-consuming and complex
Solution Approach 1:
The verification unit is designed to be self-installing within the existing pipe system. The unit includes inlet and outlet connections that interface with the pipe without requiring removal of pipe sections. The system performs self-verification by internally measuring pressure differentials across its own structure, eliminating the need for complex disassembly and reassembly operations.
Solution Approach 2:
The verification unit serves multiple functions: it acts as both a flow rate measurement device and a pressure differential sensor. The single unit can be installed in various positions within the gas flow system and provides comprehensive verification capability without requiring different components or complex installation procedures for different scenarios.
3Stability of the object's composition
If the volume between cutoff valves is large, then pressure uniformity is achieved, but the response time and verification efficiency decrease
Solution Approach 1:
The patent employs dynamic pressure detection rather than requiring static pressure equilibrium. The pressure detector continuously monitors and records pressure differentials during the flow verification process, allowing the system to achieve accurate measurements without waiting for pressure to equalize throughout a large volume. This dynamic approach maintains pressure uniformity where needed while significantly improving verification speed and efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces errors in flow rate measurement, improves the reliability of gas flow rate verification, and allows for verification without disassembling pipes, thus increasing efficiency and safety in semiconductor manufacturing.
Implementation Method 1
a pressure detector detecting a pressure of the gas supplied between the first and second cutoff valves
Implementation Method 2
a temperature detector detecting a temperature of the gas supplied between the first and second cutoff valves
Implementation Method 3
a control device verifying a flow rate of the gas flowing through the flow rate control device by using a result of the pressure detected by the pressure detector and a result of the temperature detected by the temperature detector
Data Source
AI summary
A gas flow rate verification unit capable of enhancing reliability of gas flow rate verification. The gas flow rate verification unit has a first cutoff valve that is connected to a flow rate control device and to which gas is inputted, a second cutoff valve for discharging the gas, a communication member for allowing the first cutoff valve and the second cutoff valve to communicate with each other, a pressure sensor for detecting the pressure of the gas supplied between the first cutoff valve and the second cutoff valve, a temperature detector for detecting the temperature of the gas supplied between the first cutoff valve and the second cutoff valve, and a control means for verifying the flow of the gas flowing in the flow control device, the verification being performed by using both the result of the pressure detected by the pressure sensor and the result of the temperatures detected by the temperature detector. The volume (Vk) between the valve seat of the first cutoff valve and the valve seat of the second cutoff valve is equal to or less than the volume (Ve) between the outlet of the flow control device and the valve seat of the first cutoff valve.