Gas Flow Inlet Guide Mesh for Parasitic Plasma Blocking

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Solution Overview

Problem

Existing gas distribution assemblies in process chambers suffer from parasitic plasma penetration, leading to deposition and substrate contamination.

Innovation Solution

A gas flow inlet guide with a plasma blocker, comprising a mesh material, is integrated to prevent parasitic plasma penetration while allowing gas flow, using mesh openings sized based on plasma characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a gas distribution assembly is used to deliver process gas, then gas delivery function is achieved, but parasitic plasma penetrates and causes deposition

Engineering Contradiction:
Improvesubstrate contamination preventionVSAvoidparasitic plasma penetration
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A plasma blocker is introduced as an intermediary component between the process chamber and the gas distribution assembly. The plasma blocker selectively blocks parasitic plasma while allowing process gas to pass through, preventing plasma penetration into the gas distribution assembly and subsequent deposition of particles that would contaminate substrates.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The plasma blocker utilizes a porous or mesh structure with specific opening sizes. The porous material allows gas molecules to pass through while blocking larger plasma species, achieving selective filtration based on the size difference between gas molecules and plasma particles.

Inventive Principle:
Principle #31Porous materials

2Object-affected harmful factors

If a plasma blocker with mesh material is used to prevent plasma penetration, then plasma blocking is achieved, but gas flow uniformity must be maintained

Engineering Contradiction:
Improveparasitic plasma blockingVSAvoidgas flow uniformity
Core Design Contradiction:
Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The gas distribution assembly incorporates locally optimized features including flow guides at specific locations, varying mesh densities in different regions of the plasma blocker, and strategically positioned openings. These local quality variations ensure uniform gas flow distribution across the substrate while maintaining effective plasma blocking throughout the assembly.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively reduces substrate contamination by minimizing parasitic plasma deposition within the gas flow guide, ensuring uniform gas delivery and efficient purge processes.

Implementation Method 1

Parasitic plasma from a plasma source or from a process volume of the process chamber can penetrate gas distribution assemblies and cause deposition therein

Methodology Applied
Scientific EffectPlasma: Plasma

Implementation Method 2

a plasma blocker disposed thereover... comprising a mesh material, is integrated to prevent parasitic plasma penetration while allowing gas flow, using mesh openings sized based on plasma characteristics

Methodology Applied
Scientific EffectMesh filtration: Filter (physical)

Data Source

PatentUS12518950B2Gas flow guide design for plasma suppression
Publication Date: 2026.01.06 APPLIED MATERIALS INC
  • US12518950B2 patent drawing
  • US12518950B2 patent drawing
  • US12518950B2 patent drawing

AI summary

Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas. The gas flow inlet guide having a flow guide bottom plate having an opening. A top plate is disposed over the flow guide bottom plate and a plasma blocker is disposed over the opening. The plasma blocker includes one or more apertures sized based one or more of a plasma density, an electron temperature, an ion temperature, or a characteristic of a process gas.