Gas Injection Device for FOUP Nitrogen Sealing
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Solution Overview
Problem
Existing gas injection devices for nitrogen gas into wafers' containers allow atmospheric air and particles to enter, potentially altering the wafer properties due to oxygen, moisture, or other substances.
Innovation Solution
A gas injection device with a nozzle main body, an opening/closing mechanism, and an opener that ensures atmospheric air is discharged before nitrogen gas is supplied, preventing its entry into the container by opening the gas supply port after air discharge and maintaining it closed when not in use.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the gas supply port is kept open for easy gas supply, then the ease of operation is improved, but atmospheric air and particles can enter the container, worsening the purity of the nitrogen atmosphere
Solution Approach 1:
The gas supply port is closed before the nozzle is inserted into the container, and the closing action is completed in advance before gas supply begins. This preliminary closing action prevents atmospheric air from entering the container while the port remains closed, and only opens when actually needed for gas supply.
Solution Approach 2:
The opening/closing mechanism acts as an intermediary between the gas supply system and the container environment. It controls the gas supply port's state, allowing gas to pass through when open while blocking atmospheric air when closed, thus mediating between the need for gas supply and the need to maintain pure nitrogen atmosphere.
2Object-affected harmful factors
If the gas supply port is kept closed to prevent air entry, then the purity of nitrogen atmosphere is improved, but the ease of operation for gas supply deteriorates
Solution Approach 1:
The opening/closing mechanism is pre-positioned to close the gas supply port before insertion, and the opening action is triggered automatically or manually at the precise moment gas supply is needed. This ensures the port is closed during non-use to maintain purity, yet opens easily when operation is required.
Solution Approach 2:
The gas supply port transitions from a static open or closed state to a dynamic state controlled by the opening/closing mechanism. The mechanism allows the port to change state based on operational needs - closed during storage and non-use, open during gas supply - thus resolving the contradiction between maintaining purity and enabling easy operation.
3Object-affected harmful factors
If nitrogen gas is supplied continuously to maintain inert atmosphere, then the protection of wafers is improved, but the loss of nitrogen gas increases
Solution Approach 1:
Instead of continuous nitrogen gas supply, the system uses periodic action by closing the gas supply port when not in use. Nitrogen gas is supplied only during brief periods when the port is open for actual wafer processing operations, and the port is closed during storage and non-operational times, thus maintaining wafer protection while minimizing nitrogen gas loss.
Solution Approach 2:
The opening/closing mechanism extracts and removes the gas supply port from the continuous open state, isolating it during non-use periods. This separation allows the system to maintain the nitrogen atmosphere only when necessary, rather than continuously, thereby reducing nitrogen gas consumption and loss while still providing adequate protection for the wafers.
Data Source
AI summary
There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.