Gas Injection Electrode Layout for Uniform Thin-Film Deposition

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Solution Overview

Problem

Existing gas injecting apparatuses struggle with securing uniform thin-film deposition due to non-uniform gas distribution and inefficient plasma formation, leading to non-uniform thin-films on substrates.

Innovation Solution

A gas injecting apparatus with a first and second gas supply path and electrode configuration, featuring alternating openings with specific dimensions and spacings, allows for separate gas injection and plasma generation to enhance uniformity and density, using a power supply to generate capacitively coupled plasma.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a gas injecting apparatus with multiple injecting holes is used to deposit thin-films, then deposition can be performed on substrates, but deposition uniformity deteriorates due to non-uniform gas distribution

Engineering Contradiction:
Improvedeposition uniformityVSAvoidgas distribution uniformity
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The gas supply system is segmented into multiple independent gas supply paths (first gas supply path, second gas supply path, etc.) with separate control, allowing each path to be optimized for uniform gas distribution across different regions of the substrate

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different gas supply paths are configured with different opening structures (first openings, second openings with different diameters and positions) to provide locally optimized gas distribution characteristics for different areas of the substrate, ensuring uniform deposition across the entire substrate surface

Inventive Principle:
Principle #3Local quality

2Productivity

If openings in the gas injecting apparatus are made larger to improve gas flow, then gas supply efficiency improves, but plasma formation efficiency deteriorates

Engineering Contradiction:
Improvegas supply efficiencyVSAvoidplasma formation efficiency
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

Each gas supply path is divided into multiple openings with different sizes and positions. Smaller openings maintain plasma formation efficiency while the multiplicity of openings ensures sufficient gas supply. The segmented opening structure allows simultaneous optimization of both gas flow and plasma generation.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different openings within the same gas supply path have different diameters and positions tailored to local requirements. Some openings are optimized for plasma formation (smaller, closer to substrate) while others are optimized for gas supply (larger, positioned for better flow distribution), achieving both goals through local optimization.

Inventive Principle:
Principle #3Local quality

3Device complexity

If a single gas supply path is used to simplify the apparatus structure, then device complexity is reduced, but deposition uniformity deteriorates

Engineering Contradiction:
Improvegas supply structure complexityVSAvoiddeposition uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The gas supply apparatus is segmented into multiple independent gas supply paths, each with its own openings and control mechanisms. This segmentation enables precise control over gas distribution patterns, allowing uniform deposition to be achieved despite the increased structural complexity.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Improves deposition uniformity and forms high-density plasma, resulting in high-quality thin-films on substrates.

Implementation Method 1

generating plasma between the first electrode and the second electrode

Methodology Applied
Scientific EffectCapacitively coupled plasma: Plasma

Data Source

PatentUS20260088262A1Gas spraying apparatus, substrate processing apparatus, and thin film deposition method
Publication Date: 2026.03.26 JUSUNG ENG
  • US20260088262A1 patent drawing
  • US20260088262A1 patent drawing
  • US20260088262A1 patent drawing

AI summary

The present disclosure relates to an apparatus for injecting a gas, an apparatus for processing a substrate, and a method for depositing a thin-film, and more specifically, to an apparatus for injecting a gas to deposit a thin-film by injecting a gas to a substrate, an apparatus for processing a substrate, and a method for depositing a thin-film. An apparatus for injecting a gas in accordance with an exemplary embodiment includes: a first electrode in which a first gas supply path and a second gas supply path are separately defined and which has first and second gas supply holes connected to the first and second gas supply paths, respectively; and a second electrode which is electrically insulated from and spaced apart from the first electrode and has a plurality of openings arranged alternately with the first and second supply holes.