Gas Injection Flange Assembly for Stable Pre-Mixed Process Gas

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Solution Overview

Problem

Conventional gas injection systems for semiconductor manufacturing are complex, costly, and suffer from poor flow stability, affecting the uniformity and purity of processes in reaction chambers.

Innovation Solution

A gas injection system that pre-mixes etchant and precursor gases before injection, using a flange assembly with gas channels, expansion plenums, and conduits to improve stability and purity, featuring a gas distribution assembly with dual manifolds and flange assembly components that are easier to manufacture and maintain.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conventional gas injection systems are used, then gas injection can be performed, but the system complexity and fabrication cost increase

Engineering Contradiction:

Improvefabrication costVSAvoidsystem complexity

Core Design Contradiction:

Ease of manufactureVSDevice complexity

Solution Approach 1:

The gas injection system is divided into separate functional modules: a flange assembly with gas channels for distribution and a separate mixing assembly with manifolds for gas mixing. This segmentation allows each component to be optimized independently, reducing overall system complexity while maintaining injection functionality.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The mixing function is extracted from the flange assembly and placed in a separate mixing assembly upstream of the flange. This extraction simplifies the flange assembly design, making it easier to manufacture and install, while the mixing assembly handles the complex gas mixing requirements separately.

Inventive Principle:

Principle #2Taking out (Extraction)

2Reliability

If conventional gas injection systems are used, then gas injection can be performed, but flow stability deteriorates

Engineering Contradiction:

Improveflow stabilityVSAvoidprocess uniformity

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

Gases are mixed upstream in the mixing assembly before entering the flange assembly and reaction chamber. This preliminary mixing action ensures uniform gas composition and stable flow characteristics are established before the gas reaches the deposition process, improving both flow stability and process uniformity.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

A carrier gas is introduced through a separate channel in the flange assembly to act as an intermediary. This carrier gas mixes with the precursor and etchant gases in the reaction chamber, stabilizing the overall gas flow and improving uniformity of the deposition process.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Reliability

If conventional gas injection systems are used, then gas injection can be performed, but gas purity deteriorates due to metallic contaminants

Engineering Contradiction:

Improvegas purityVSAvoidmetallic contaminants

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The mixing assembly is constructed from materials that do not introduce metallic contaminants into the gas stream. By separating the mixing function from traditional metal flange assemblies and using contaminant-free materials, the system extracts the source of contamination while maintaining mixing functionality.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The system uses high-purity gases and maintains an inert environment throughout the gas delivery path. The flange assembly and mixing assembly are designed to prevent contamination, ensuring that the process gases remain pure and free from metallic contaminants that could affect deposition quality.

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances process gas stability and uniformity, reduces complexity and cost, and improves purity by removing metallic contaminants from wetted regions, thereby optimizing semiconductor manufacturing processes.

Implementation Method 1

a plurality of dual manifolds, wherein each one of the plurality of the dual manifolds comprises a first input port fluidly coupled to one of the plurality of precursor gas lines, a second input port fluidly coupled to one of the plurality of etchant gas lines, and an output port configured to output a process gas comprising a mix of the precursor gas and the etchant gas

Methodology Applied

Scientific EffectGas mixing:

Data Source

PatentUS20260005041A1Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber

Publication Date: 2026.01.01 ASM IP HLDG BV

AI summary

Gas injection systems, reactor systems including gas injection systems, and methods for supplying a process gas to a reaction chamber are disclosed. The gas injection systems disclosed include gas source assemblies coupled to gas distribution assemblies in which an etchant gas and a precursor gas are combined prior to injection into a reaction chamber.