Gas Injection System for Ion Beam Devices
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Solution Overview
Problem
Conventional ion beam devices require large process chambers due to the need for a shower head structure to introduce residue removal gases, leading to inefficient gas delivery as the gases diffuse before reaching the substrate, resulting in reduced effectiveness and increased chamber size.
Innovation Solution
A gas injection system with integrated gas distributors on an extraction plate that emits residue removal gases in close proximity to the substrate, using gas orifices and conduits to deliver the gases directly onto the substrate surface, reducing the distance and enhancing concentration and coverage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a shower head structure is used to introduce residue removal gases, then gas delivery coverage is improved, but the process chamber size increases significantly
Solution Approach 1:
The patent extracts the gas distribution function from a separate shower head structure and integrates it directly into the extraction plate. The gas distributors are mounted on the extraction plate surface, eliminating the need for a distant shower head and reducing the required chamber volume while maintaining effective gas delivery to the substrate.
Solution Approach 2:
The patent merges the gas distribution function with the extraction plate by mounting gas distributors directly on it. This combination allows the extraction plate to serve dual purposes: extracting ions and delivering residue removal gases, thereby eliminating the need for a separate shower head structure and reducing chamber size.
2Ease of operation
If the shower head is positioned far from the substrate, then sufficient clearance for substrate and components is achieved, but gas delivery efficiency decreases
Solution Approach 1:
The patent uses gas distributors with gas orifices as intermediaries mounted on the extraction plate. These distributors position the gas orifices in close proximity to the substrate surface, enabling efficient gas delivery without requiring a distant shower head structure, thus maintaining both clearance and efficiency.
Solution Approach 2:
The patent changes the spatial arrangement by mounting gas distributors on the extraction plate surface rather than positioning a shower head at a distance. This dimensional repositioning allows gas orifices to be close to the substrate in the vertical dimension while maintaining horizontal clearance, improving gas delivery efficiency without sacrificing operational space.
3Volume of stationary object
If residue removal gases are emitted from a distance, then chamber size is reduced, but gas concentration at substrate surface decreases
Solution Approach 1:
The patent applies local quality by positioning gas orifices in close proximity to the substrate surface through distributors mounted on the extraction plate. This localized gas delivery ensures high gas concentration at the substrate surface where it is needed, rather than emitting gas from a distant position throughout the chamber.
4Quantity of substance
If a shower head structure is used, then gas distribution coverage is improved, but device complexity increases
Solution Approach 1:
The patent merges the gas distribution function with the existing extraction plate structure by mounting distributors on it. This integration eliminates the need for a separate shower head structure and its associated complexity, while still achieving effective gas distribution coverage through the gas orifices in the distributors.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for a more efficient and precise application of residue removal gases, reducing the amount needed and enabling targeted delivery, while also allowing for a smaller process chamber design, improving the quality of substrate processing.
Implementation Method 1
emitting the residue removal gas from a gas orifice in a gas distributor removably mounted to the extraction plate
Data Source
AI summary
A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.