Asymmetric Gas Injector Assembly for Precursor Activation
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Solution Overview
Problem
Current gas injectors in semiconductor processing are unable to fully activate precursors, which can lead to suboptimal process performance due to inadequate thermal exposure, especially when multiple precursors are used or when precursors require different activation times.
Innovation Solution
A gas injector assembly with a design that includes a larger precursor gas supply conduit for one precursor and a smaller conduit for another, allowing for extended thermal exposure and mixing of precursors before exposure to the substrate, ensuring full activation and uniform mixing before processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a standard gas injector design is used with equal precursor gas supply conduits, then the device complexity is low, but the precursor activation is incomplete and process performance is suboptimal
Solution Approach 1:
The patent applies local quality by making the precursor gas supply conduits asymmetric in size. Specifically, the first precursor gas supply conduit has a larger diameter than the second precursor gas supply conduit. This allows different precursors to receive appropriate thermal exposure based on their individual activation requirements, with larger conduits providing longer thermal paths for precursors needing extended activation time.
2Reliability
If precursors are exposed to the substrate immediately after mixing, then the process time is short, but the precursors are not fully activated leading to poor process performance
Solution Approach 1:
The patent implements preliminary action by providing thermal exposure to precursors through the supply conduits before they reach the mixing region and subsequent substrate exposure. The larger first precursor gas supply conduit enables extended thermal exposure and activation of the first precursor before it mixes with the second precursor, ensuring both precursors are fully activated prior to substrate processing.
3Adaptability or versatility
If multiple precursors with different activation times are used, then the process versatility is improved, but the mixing and activation uniformity becomes difficult to control
Solution Approach 1:
The patent addresses activation uniformity for multiple precursors by assigning different conduit sizes to different precursors. The larger first precursor gas supply conduit provides extended thermal path for precursors requiring longer activation, while the smaller second precursor gas supply conduit is suitable for precursors with shorter activation requirements. This localized adaptation ensures uniform activation across different precursor types.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances precursor activation, improves process performance, and allows for the formation of higher-quality, uniform films on substrates by ensuring precursors are fully activated before exposure, thereby increasing process throughput and yield.
Implementation Method 1
A size of the first precursor gas supply conduit extending from the first precursor gas entry to the first precursor gas inlet may be larger than the size of the second precursor gas supply conduit extending from the second precursor gas entry to the second precursor gas inlet
Data Source
AI summary
A gas injector assembly and a substrate processing apparatus comprising the gas injector assembly is disclosed. Embodiments of the presently described gas injector assembly comprise a gas injector, a first precursor gas supply conduit and a second precursor gas supply conduit. A size of the first precursor gas supply conduit is larger than the size of the second precursor gas supply conduit.