Humidified Gas Supply Line Preheating to Prevent Substrate Condensation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In semiconductor and flat display panel manufacturing, the heat treatment of substrates with humidified gas can lead to moisture condensation and defects due to inadequate heating in certain areas, especially where line heaters cannot be installed, causing temperature drops below the dew point and resulting in watermarks on the substrate.
Innovation Solution
A substrate treating apparatus and method that includes a housing with a heat treating chamber, a gas supply unit with a humidified gas supply line and a dry gas supply line, and a controller to maintain stable humidity by heating the gas supply lines and controlling the flow of dry gas to prevent condensation, even in areas without a line heater.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a line heater is not installed in certain areas of the gas supply line, then the device complexity is reduced and installation is easier, but the temperature of the humidified gas decreases below the dew point causing moisture condensation
Solution Approach 1:
The gas supply line is pre-heated using a heater installed in the upstream region before the humidified gas is supplied. This preliminary heating action ensures that the gas supply line, particularly the downstream region without a line heater, maintains a temperature above the dew point of the humidified gas, preventing moisture condensation when the gas flows through.
Solution Approach 2:
Dry gas is introduced as an intermediary substance into the gas supply line. The dry gas mixes with the humidified gas and provides thermal insulation, helping to maintain the temperature of the gas supply line above the dew point without requiring a line heater in the downstream region, thus preventing moisture condensation.
2Productivity
If humidified gas is supplied to the treatment space, then the substrate can be heat treated, but moisture condenses on the substrate causing defects when the gas temperature is not maintained
Solution Approach 1:
The gas supply line is pre-heated before supplying humidified gas to the treatment space. This ensures that the humidified gas maintains a temperature above the dew point throughout the supply line, preventing moisture condensation on the substrate during heat treatment and maintaining substrate quality.
Solution Approach 2:
Dry gas is introduced as an intermediary to mix with the humidified gas in the gas supply line. This mixture provides thermal insulation and maintains the gas temperature above the dew point, allowing humidified gas to be supplied for substrate heat treatment without causing moisture condensation defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents defects on the substrate by ensuring stable humidity and preventing moisture condensation during heat treatment, allowing for effective treatment with humidified gas even in areas without a line heater, thereby maintaining consistent substrate quality.
Implementation Method 1
a first heater installed in the main supply line, the main supply line has: a first region in which the first heater is installed
Implementation Method 2
opening the second valve to heat the second region with the dry gas
Implementation Method 3
When the temperature of the humidified gas decreases below the dew point temperature, the moisture in the humidified gas condenses
Data Source
AI summary
A method of treating a substrate treats a substrate by using a substrate treating apparatus that includes a main supply line connected to a humidified gas supply line and a dry gas supply line, having a first region in which a first heater is installed, and a second region located downstream of the first region. The method includes a heating operation of heating the second region with the dry gas heated in the first region by supplying the dry gas into the main supply line in a state where the first heater is controlled to heat the first region; and a substrate treating operation of supplying the humidified gas into the main supply line after the heating operation and allowing the humidified gas to pass through the first region and the second region and to be supplied into the treatment space to treat the substrate disposed in the treatment space.