Semiconductor Gas Mixing Layout for Stable Concentration Supply

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Solution Overview

Problem

Conventional gas supply devices in semiconductor manufacturing face challenges in supplying mixed gases with stable concentrations to a process chamber in a short time due to unequal flow path lengths from fluid control units to the chamber, and they require significant installation space.

Innovation Solution

A gas supply device with symmetrically arranged connecting portions and a tournament-like connecting flow path that equalizes flow path lengths from fluid control units to the processing chamber, using merging flow paths and tournament-like structures to merge gases efficiently.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If fluid control units are arranged in parallel with outlet-side flow paths connected to a manifold block, then the device structure is simple and easy to manufacture, but the flow path lengths from each fluid control unit to the process chamber become unequal, causing unstable gas concentrations

Engineering Contradiction:
Improvegas concentration stabilityVSAvoidflow path structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies asymmetry principle by designing a tree-structured flow path where branches are asymmetrically arranged but compensated with flow path length equalization features. This allows the system to achieve equal flow path lengths from multiple fluid control units to the process chamber while maintaining a compact, non-radial configuration. The asymmetric design enables space-saving compared to radial arrangements while still equalizing flow paths through strategic placement of merging portions and flow path length adjustment.

Inventive Principle:
Principle #4Asymmetry

2Manufacturing precision

If fluid control units are arranged radially to equalize flow path lengths, then gas concentration stability is improved, but the installation space becomes large

Engineering Contradiction:
Improvegas concentration stabilityVSAvoidinstallation space
Core Design Contradiction:
Manufacturing precisionVSArea of stationary object

Solution Approach 1:

The patent applies the nesting principle by organizing flow paths in a hierarchical tree structure where smaller flow path branches are nested within larger structural frameworks. The flow path branches are arranged in a compact, space-efficient manner resembling nested structures, allowing multiple fluid control units to be integrated into a compact configuration. This nesting approach reduces the overall footprint compared to radial arrangements while maintaining equal flow path lengths through the hierarchical merging structure.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The patent transitions from a two-dimensional radial arrangement to a three-dimensional tree-structured configuration. By utilizing vertical and depth dimensions in addition to horizontal space, the system achieves equal flow path lengths without requiring large radial expansion. The tree structure allows flow paths to merge at different levels and positions, optimizing space utilization while maintaining flow path equality through strategic placement of merging portions.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Productivity

If unequal flow path lengths are used in the gas supply device, then the installation space is reduced, but the time to supply mixed gas with stable concentration to the process chamber increases

Engineering Contradiction:
Improvegas supply speedVSAvoidgas concentration stability
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies preliminary action by pre-designing and pre-configuring the flow path structure with equalized path lengths before actual gas supply operations. The tree-structured flow path system is constructed with predetermined merging portions and flow path length equalization features that ensure equal travel distances from each fluid control unit to the process chamber. This preliminary structural configuration eliminates the need for dynamic adjustment during operation and ensures consistent, stable gas concentration delivery at high speed.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS12494383B2Gas supply device and semiconductor manufacturing apparatus
Publication Date: 2025.12.09 TOKYO ELECTRON LTD
  • US12494383B2 patent drawing
  • US12494383B2 patent drawing
  • US12494383B2 patent drawing

AI summary

A gas supply device capable of saving space and supplying a mixed gas having components with stable concentration to a processing chamber in a short time includes: a plurality of fluid control units each including a flow path through which gas flows, and fluid control devices provided in the middle of the flow path; a merging flow path including a plurality of connecting portions fluidly connected to the plurality of fluid control units and a single gas outlet portion which derives the gas introduced through the plurality of connecting portions; wherein a plurality of connecting portions is arranged symmetrically with respect to the gas outlet portion in the flow path direction of the merging flow path, and two or more fluid control units are fluidly connected to each of the plurality of connecting portions.