Gas Mixture Supply Line Positioning for Semiconductor Condensation

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Solution Overview

Problem

Conventional gas mixture supplying apparatuses for semiconductor manufacturing require increased power consumption due to heating of pipelines and supply lines to prevent condensation of liquid source gases, leading to inefficiencies in energy usage.

Innovation Solution

The liquid source gas is supplied from a gas supply line positioned closer to the gas outlet than the typical gas, with the liquid source gas being vaporized and supplied downstream of a filter, reducing the need for extensive heating and minimizing power consumption.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the common pipeline and gas mixture supply line are heated to high temperature to prevent condensation of liquid source gas, then condensation is prevented, but power consumption is increased

Engineering Contradiction:
Improveprevention of liquid source gas condensationVSAvoidpower consumption of heater
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The liquid source gas is supplied from a gas supply line positioned closer to the gas outlet than the typical gas, so that the liquid source gas is introduced into the common pipeline after the filter. This preliminary positioning reduces the length of pipeline requiring heating, thereby preventing condensation while reducing power consumption.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The invention applies heating locally only to the necessary portion of the pipeline where liquid source gas flows, rather than heating the entire common pipeline and gas mixture supply line. By positioning the liquid source gas supply line closer to the outlet, heating is concentrated only on the critical section, reducing overall energy consumption while maintaining reliability.

Inventive Principle:
Principle #3Local quality

2Reliability

If a filter is provided in the common pipeline to remove particles, then particle removal is achieved, but gas mixture pressure is increased and condensation likelihood is raised

Engineering Contradiction:
Improveparticle removal from gas mixtureVSAvoidgas mixture pressure
Core Design Contradiction:
ReliabilityVSStress or pressure

Solution Approach 1:

The invention uses the spatial arrangement of gas supply lines as an intermediary solution. By positioning the liquid source gas supply line closer to the gas outlet and downstream of the filter, the system mediates between the need for particle removal (filter) and pressure management, reducing the pressure increase effect on liquid source gas while maintaining filtration effectiveness.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces power consumption by minimizing the heating required to prevent condensation of the liquid source gas, achieving energy savings while maintaining effective gas mixture delivery to semiconductor processing chambers.

Implementation Method 1

a liquid source gas vaporized by heating a liquid source material supplied from a liquid source material supply unit by a vaporizing unit

Methodology Applied
Scientific EffectVaporization: Evaporation

Implementation Method 2

the common pipeline (manifold), the gas mixture supply line and so forth are conventionally heated to a high temperature by a heater, thus preventing the condensation of the liquid source gas

Methodology Applied
Scientific EffectHeating: Heating

Implementation Method 3

a filter is provided in the common pipeline (manifold) or the gas mixture supply line to remove particles present in the gas mixture

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Data Source

PatentUS8276891B2Gas mixture supplying method and apparatus
Publication Date: 2012.10.02 TOKYO ELECTRON LTD
  • US8276891B2 patent drawing
  • US8276891B2 patent drawing

AI summary

A gas mixture supplying method includes supplying plural kinds of gases through gas supply lines connected to a common pipeline and supplying a gas mixture of the plural kinds of gases from a gas outlet of the common pipeline into a region where the gas mixture is used through a gas mixture supply line. When a typical gas supplied in a gaseous state from a gas supply unit and a liquid source gas vaporized by heating a liquid source material supplied from a liquid source material supply unit by a vaporizing unit are supplied simultaneously, the liquid source gas is supplied from one of the gas supply lines provided at a position closer to the gas outlet than that for the typical gas, and the liquid source gas is supplied to a downstream side of a filter for removing particles in the typical gas.