Gas Nozzle Crystal Suppression via Periodic Liquid Purge
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Solution Overview
Problem
The existing substrate liquid processing apparatuses face issues with crystal formation at the edges of gas nozzles due to turbulence, leading to hindrances in gas discharge and processing efficiency.
Innovation Solution
A substrate liquid processing apparatus with a control unit that stops gas supply during idle periods and introduces processing liquid into the gas supply line, preventing crystal formation and facilitating gas discharge by alternating between gas supply and liquid introduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If gas is supplied from the gas nozzle to maintain uniform processing liquid state, then the processing liquid uniformity is improved, but crystal formation occurs at the edge of the gas nozzle opening due to gas flow turbulence
Solution Approach 1:
The gas supply is performed periodically rather than continuously. The control unit controls the gas supply unit to supply gas to the processing tub in a periodic manner, specifically supplying gas during periods when substrates are not accommodated in the processing tub. This periodic gas supply maintains processing liquid uniformity while avoiding continuous turbulence that causes crystal formation at the gas nozzle opening.
2Object-generated harmful factors
If gas supply is stopped to prevent crystal formation, then crystal generation is suppressed, but processing liquid uniformity cannot be maintained
Solution Approach 1:
The gas supply is performed periodically rather than continuously. The control unit controls the gas supply unit to supply gas to the processing tub in a periodic manner, specifically supplying gas during periods when substrates are not accommodated in the processing tub. This periodic gas supply maintains processing liquid uniformity while avoiding continuous turbulence that causes crystal formation at the gas nozzle opening.
3Productivity
If gas is supplied continuously to maintain processing efficiency, then processing liquid circulation is improved, but gas discharge is hindered by crystal accumulation at the gas nozzle
Solution Approach 1:
The gas supply is performed periodically rather than continuously. The control unit controls the gas supply unit to supply gas to the processing tub in a periodic manner, specifically supplying gas during periods when substrates are not accommodated in the processing tub. This periodic gas supply maintains processing liquid uniformity while avoiding continuous turbulence that causes crystal formation at the gas nozzle opening.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively suppresses crystal formation at the gas nozzle edges, ensuring smooth gas discharge and maintaining processing liquid uniformity, thereby enhancing processing efficiency and preventing clogging.
Implementation Method 1
a decompression unit configured to introduce the processing liquid within the processing tub into the gas supply line by decompressing the gas supply line
Implementation Method 2
an upward flow of the processing liquid is generated within the tub. Accordingly, though it becomes easier to maintain a state of the processing liquid uniform, stay of the processing liquid at a certain place, which is caused by the flow of the gas, may also easily occur. To be specific, at an edge of an opening of the gas nozzle, the stay of the processing liquid, which is caused by a turbulence of the gas flow, may easily occur.
Data Source
AI summary
A substrate liquid processing apparatus A1 includes a processing tub 41 accommodating a processing liquid 43 and a substrate 8; a gas nozzle 70 discharging a gas into a lower portion within the processing tub 41; a gas supply unit 90 supplying the gas; a gas supply line 93 connecting the gas nozzle 70 with the gas supply unit 90; a decompression unit 95 introducing the processing liquid 43 within the processing tub 41 into the gas supply line 93 by decompressing the gas supply line 93; and a control unit 7 performing a first control of controlling the gas supply unit 90 to stop supply of the gas and controlling the decompression unit 95 to introduce the processing liquid 43 into the gas supply line 93 in a part of an idle period during which the substrate 8 is not accommodated in the processing tub 41.