Integrated Gas Panel Apparatus Flow Channel Redesign
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Solution Overview
Problem
Conventional integrated gas panel apparatuses face challenges in achieving short time/high speed responsiveness and stable gas concentration due to elongated main flow channels and uneven gas arrival times, which affect semiconductor manufacturing processes.
Innovation Solution
The apparatus rearranges branch flow channels to be on both sides of the main flow channel, shortening its length and using projecting pipes to enhance gas mixing and synchronization, while maintaining a conventional panel shape and structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If branch flow channels are arranged in parallel at one side of the main flow channel with even intervals, then the structure is simple and easy to manufacture, but the main flow channel length becomes long and gas arrival time increases, deteriorating responsiveness
Solution Approach 1:
The patent transitions from a two-dimensional planar arrangement where all branch channels are on one side to a three-dimensional configuration where branch channels are arranged on both sides of the main flow channel. This spatial reorganization shortens the main flow channel length and reduces gas arrival time while maintaining manufacturing simplicity through modular block body assembly
2Stability of the object's composition
If the main flow channel length is increased to promote gas mixing, then gas mixing becomes sufficient, but pipe capacity increases and responsiveness deteriorates
Solution Approach 1:
The patent segments the branch channel connections to occur at multiple different positions along the main flow channel rather than at a single location. This segmentation promotes gradual gas mixing throughout the channel length while keeping the overall channel length short, thus maintaining both mixing uniformity and responsiveness
Solution Approach 2:
By arranging branch channels on both sides of the main flow channel, the patent creates a more compact three-dimensional structure that achieves sufficient gas mixing within a shorter channel length, resolving the trade-off between mixing quality and responsiveness
3Ease of manufacture
If branch flow channels are arranged with even intervals, then the structure is regular and easy to manufacture, but gas arrival times become uneven and gas concentration stability deteriorates
Solution Approach 1:
The patent applies different connection positions for different branch channels along the main flow channel, creating local variations in connection locations. This allows each branch channel to be optimized for its specific gas type and flow requirements, achieving stable gas concentration while maintaining manufacturing ease through modular design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves responsiveness and stabilizes gas concentration by reducing the main flow channel length, promoting full gas mixing, and ensuring consistent gas arrival times, even with small gas flows, thus enhancing the efficiency of semiconductor manufacturing processes.
Implementation Method 1
a distal end of the projecting pipe further projects inward from an inside surface of the main flow channel
Implementation Method 2
promoting full gas mixing
Data Source
AI summary
Provided is an integrated gas panel apparatus which has excellent responsiveness, stabilizes gas concentration, and furthermore, can keep a conventional panel shape as it is. A panel body comprises at least a main flow channel block body for forming a main flow channel, and a branch flow channel block body for forming a branch flow channel. The branch flow channel block bodies are arranged on the both right and left sides to face each other by having the main flow channel block body at the center.