Gas-Permeable Workpiece Chuck for Uniform Dielectric Film Bonding
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Solution Overview
Problem
The semiconductor industry faces challenges in creating smaller and more creative packaging techniques for semiconductor dies, particularly in Package-on-Package (PoP) technology, where efficient integration and component density are crucial.
Innovation Solution
A workpiece handling apparatus with a gas permeable buffer layer and vacuum system is used to securely attach a dielectric film to a semiconductor package, ensuring even bonding and patterning, while a robotic device facilitates precise placement and patterning of conductive bumps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a rigid supporting platform is used to hold the workpiece, then structural strength and stability are improved, but the bonding uniformity and surface contact quality deteriorate due to inability to adapt to surface irregularities
Solution Approach 1:
The patent introduces a flexible buffer layer made of elastomeric material between the rigid supporting platform and the workpiece. This flexible layer can deform to conform to surface irregularities, ensuring uniform contact and bonding across the entire workpiece surface while the rigid platform maintains structural strength.
Solution Approach 2:
The system combines rigid and flexible materials in a composite structure. The rigid supporting platform provides structural strength, while the flexible elastomeric buffer layer provides adaptability and uniform contact, creating a composite system that achieves both strength and bonding uniformity simultaneously.
2Force
If a vacuum system is applied directly to the supporting platform, then workpiece holding force is improved, but the vacuum distribution uniformity deteriorates due to surface irregularities
Solution Approach 1:
The flexible buffer layer acts as an intermediary that transmits vacuum force uniformly across the workpiece surface. Its elastomeric properties allow it to deform and maintain consistent contact, ensuring uniform vacuum distribution even when the workpiece surface has irregularities.
Solution Approach 2:
The buffer layer serves as an intermediary between the vacuum system and the workpiece. It mediates the transmission of vacuum force, distributing it uniformly across the workpiece surface while isolating the vacuum system from direct contact with surface irregularities.
3Strength
If the buffer layer is made of hard material, then structural support is improved, but the adaptability to workpiece surface variations and bonding quality deteriorate
Solution Approach 1:
The buffer layer is specifically designed as a thin film of elastomeric material that provides flexibility and adaptability. This thin flexible film can conform to surface variations while still providing adequate support, achieving both adaptability and sufficient structural function.
Solution Approach 2:
The patent changes the material parameter from hard to elastomeric (flexible) to achieve adaptability. The elastomeric material's ability to deform elastically allows it to adapt to surface variations while maintaining sufficient mechanical support through its elastic recovery and distributed force transmission.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient and reliable attachment of dielectric films to semiconductor packages, enhancing integration and component density, and facilitating the manufacturing of high-density semiconductor devices with improved functionalities.
Implementation Method 1
a suction force provided by the vacuum system to secure the dielectric film on the gas permeable buffer layer
Implementation Method 2
a gas permeable buffer layer covering a supporting surface of the porous supporting platform, wherein a suction force provided by the vacuum system is passed through the gas permeable buffer layer to secure a workpiece on the gas permeable buffer layer
Data Source
AI summary
A workpiece chuck includes a supporting platform, a vacuum system, and a gas permeable buffer layer. The supporting platform has a supporting surface for holding a workpiece thereon. The vacuum system is disposed under and in gas communication with the supporting platform. The gas permeable buffer layer is disposed over the supporting platform and covers the supporting surface, wherein a hardness scale of the gas permeable buffer layer is smaller than a hardness scale of the supporting platform.


