Gas Supply Pipe Length Adjustment for Uniform Processing

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Solution Overview

Problem

In substrate processing apparatuses with multiple processing containers connected to a common gas supply source, variations in processing results occur due to differing pipe lengths, leading to uneven distribution of processing gases and inconsistent outcomes among containers.

Innovation Solution

A processing method that simultaneously supplies processing gas to all containers and then individually adjusts the supply based on pipe length, ensuring even distribution by varying the time and flow rate of gas to each container, using a plasma forming unit to convert gases and measuring specific components or film thickness for precise timing adjustments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a common gas supply source is connected to multiple processing containers, then the number of gas supply sources is reduced and facility cost decreases, but variations in pipe lengths cause uneven gas distribution and processing result variations

Engineering Contradiction:
Improvenumber of gas supply sourcesVSAvoiduniformity of processing results
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by making each processing container have equal gas supply capability through individual pipe length adjustment. Each container's pipe is modified locally (lengthened or shortened) to compensate for its position relative to the common gas supply source, ensuring that gas flow and processing results are uniform across all containers despite their different locations in the system.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the physical parameter of pipe length for each processing container to achieve equal gas distribution. By adjusting the length parameter of individual pipes connecting to the common gas supply source, the system compensates for positional variations and ensures uniform gas flow rates to all processing containers, thereby eliminating processing result variations.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If processing gas is supplied simultaneously to all processing containers, then throughput is improved, but uneven gas distribution due to different pipe lengths causes inconsistent processing outcomes

Engineering Contradiction:
ImprovethroughputVSAvoidconsistency of processing results
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent enables simultaneous gas supply to all processing containers while maintaining processing consistency by applying local quality adjustments to each container's pipe. Each pipe is individually adjusted in length to compensate for its specific position, ensuring that all containers receive equivalent gas flow rates simultaneously, thus achieving both high throughput and consistent processing results.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent creates equipotential conditions for gas supply by equalizing the effective pipe length from the common gas supply source to each processing container. This ensures that all containers are in an equivalent state regarding gas flow resistance, allowing simultaneous supply to proceed with uniform gas distribution and consistent processing outcomes across all containers.

Inventive Principle:
Principle #12Equipotentiality

3Manufacturing precision

If individual gas supply is used for each processing container, then processing consistency is maintained, but the number of gas supply sources increases and facility cost rises

Engineering Contradiction:
Improveuniformity of processing resultsVSAvoidnumber of gas supply sources
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies universality by making a single common gas supply source serve all processing containers equally. Through individual pipe length adjustments, one gas supply source achieves the same level of processing consistency that would traditionally require multiple separate supply sources, thereby reducing facility complexity while maintaining uniformity of results.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent changes the pipe length parameter for each container's connection to the common gas supply source, transforming a potentially uneven distribution system into an equitable one. This parameter adjustment allows a single gas supply source to provide consistent gas flow to all containers, eliminating the need for multiple supply sources while maintaining processing uniformity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively suppresses variations in processing results among containers by ensuring uniform gas distribution, regardless of pipe length differences, thereby maintaining consistent outcomes across all processing containers.

Implementation Method 1

a plasma forming unit configured to convert the processing gas into plasma; wherein the plasma is supplied to the plurality of processing containers

Methodology Applied
Scientific EffectPlasma: Plasma

Data Source

PatentUS10896858B2Processing apparatus and processing method
Publication Date: 2021.01.19 TOKYO ELECTRON LTD
  • US10896858B2 patent drawing
  • US10896858B2 patent drawing
  • US10896858B2 patent drawing

AI summary

Disclosed is a processing method for performing a processing corresponding to a processing gas in a plurality of processing containers which are connected to a gas supply source, and at least some of which have different lengths of pipes to the gas supply source. The processing method includes simultaneously supplying the processing gas from the gas supply source to the plurality of processing containers, and individually supplying the processing gas from the gas supply source to the plurality of processing containers or to some of the plurality of processing containers.