Gas Supply Line Recirculation to Prevent Semiconductor Flow Hunting
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Solution Overview
Problem
In semiconductor manufacturing, sudden errors in gas supply flow rate (hunting) occur due to pressure variations in the gas supply line, affecting process performance.
Innovation Solution
A gas supplying apparatus with a circulation line branching off from the gas supply line, an ejector for recycling gas, and a flow control module to regulate gas flow rates by controlling pressure, along with valves and pressure gauges for precise control, prevents hunting by managing internal pressures and flow rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If gas is supplied through a simple supply line, then the device complexity is low, but sudden errors (hunting) occur in gas supply flow rate due to pressure variations
Solution Approach 1:
The gas supply system is divided into separate functional modules: a circulation line for pressure stabilization, a supply line for gas delivery, an ejector for gas mixing and pressure equalization, and a flow control module for precise flow rate regulation. This segmentation allows each module to perform its specific function optimally, preventing hunting while maintaining manageable system complexity.
Solution Approach 2:
The ejector acts as an intermediary device between the circulation line and the supply line. It mixes gas from both lines and equalizes pressure before delivering to the chamber, preventing sudden pressure variations and flow rate errors while integrating the functions of pressure stabilization and gas supply.
2Manufacturing precision
If a circulation line is added to prevent hunting, then gas supply precision is improved, but the device complexity increases
Solution Approach 1:
The circulation line and supply line are merged through the ejector, which combines gas flows from both lines and delivers mixed gas to the chamber. This merging allows the system to achieve precise flow rate control through coordinated operation of both lines while avoiding the need for completely separate control systems.
Solution Approach 2:
The system controls gas flow rate by changing pressure parameters in the circulation line and supply line, and by adjusting the opening degrees of first and second circulation valves. These parameter changes enable precise flow rate control without requiring complex mechanical adjustment mechanisms.
3Reliability
If multiple valves and pressure gauges are added for precise control, then gas supply reliability is improved, but the ease of operation decreases
Solution Approach 1:
Pressure gauges are installed in the circulation line, supply line, and chamber to provide real-time pressure feedback. The control system uses this feedback to automatically adjust the opening degrees of circulation valves and maintain target pressures, ensuring consistent gas supply while reducing the need for manual intervention.
Solution Approach 2:
The system performs self-regulation through automatic control: when pressure deviations are detected by gauges, the control system automatically adjusts valve openings to restore target pressures. This self-service capability maintains high reliability while minimizing operational complexity by reducing manual monitoring and adjustment requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures precise control of gas flow rates, preventing sudden changes and improving the consistency of the gas supply, thereby enhancing the precision and reliability of semiconductor manufacturing processes.
Implementation Method 1
an ejector having an internal space that sucks a gas provided from the circulation line using a pressure of the gas introduced from the gas source
Implementation Method 2
an ejector having an internal space that sucks a gas provided from the circulation line using a pressure of the gas introduced from the gas source
Data Source
AI summary
Proposed are a gas supplying apparatus, a gas supply control method, and a substrate processing apparatus. The device that supplies a gas to a chamber adapted to perform a processing operation on a substrate includes a gas supply line connected from a gas source to the chamber and providing a flow path for the gas, a circulation line branching off from a branch point of the gas supply line and connected to an upstream side of the branch point, an ejector having an internal space that sucks a gas provided from the circulation line using a pressure of the gas introduced from the gas source, and injecting the gas in the internal space into the gas supply line, and a flow control module configured to regulate a flow rate of the gas supplied to the chamber by controlling the pressure of the gas in the gas supply line.