Gas Discharge Chamber Recovery Control Using Performance Feedback

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Solution Overview

Problem

Existing gas control apparatuses for excimer light sources in photolithography lack adaptive gas recovery settings, leading to inefficient operation due to fixed settings that do not account for variations in light source performance over time, resulting in suboptimal gas discharge chamber performance.

Innovation Solution

A gas control apparatus with a monitoring system that estimates performance parameters such as energy output and spectral features, and a control system that adjusts the gas recovery setting, including pressure, based on comparisons to thresholds, ensuring optimal operation by iteratively refining the gas recovery setting during standard mode.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If fixed gas recovery settings are used in gas discharge chambers, then device complexity is reduced and ease of operation is improved, but light source performance deteriorates over time due to inability to account for performance variations

Engineering Contradiction:
Improvegas recovery operationVSAvoidlight source performance
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The gas recovery setting is transformed from a fixed static value to a dynamic adjustable parameter. The control system automatically modifies the gas recovery setting based on monitored performance parameters, enabling the system to adapt to performance variations over time while maintaining ease of operation.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

A feedback loop is established where performance parameters of the gas discharge chamber are continuously monitored and fed back to the control system. The control system uses this feedback to automatically adjust the gas recovery setting, ensuring optimal performance without requiring manual intervention.

Inventive Principle:
Principle #23Feedback

2Reliability

If dynamic adjustment of gas recovery setting is implemented, then light source performance is improved and adaptability is enhanced, but device complexity increases due to additional monitoring and control systems

Engineering Contradiction:
Improvelight source performanceVSAvoidgas control system
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The control system performs multiple functions: it monitors performance parameters, compares them to thresholds, determines when adjustment is needed, and executes the adjustment of gas recovery settings. This multi-functionality consolidates what could be separate complex subsystems into a unified control architecture.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The gas control apparatus performs self-adjustment of the gas recovery setting based on its own monitored performance data. The system serves itself by automatically detecting performance deviations and correcting them without external intervention, reducing the need for additional complex control infrastructure.

Inventive Principle:
Principle #25Self-service

3Adaptability or versatility

If manual adjustment of gas recovery settings is required, then adaptability to performance variations is improved, but productivity decreases due to increased manual intervention

Engineering Contradiction:
Improvegas recovery adaptationVSAvoidphotolithography production efficiency
Core Design Contradiction:
Adaptability or versatilityVSProductivity

Solution Approach 1:

The automatic feedback control system continuously monitors performance parameters and adjusts gas recovery settings in real-time, eliminating the need for manual intervention. This maintains high adaptability to performance variations while preserving photolithography production efficiency by keeping the system self-regulating.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system automatically adjusts its own gas recovery settings based on monitored performance, serving itself without requiring operator intervention. This self-service capability maintains adaptability while maximizing productivity by eliminating downtime associated with manual adjustments.

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS20240291226A1Gas control apparatus for gas discharge stage
Publication Date: 2024.08.29 CYMER INC
  • US20240291226A1 patent drawing
  • US20240291226A1 patent drawing
  • US20240291226A1 patent drawing

AI summary

A gas control apparatus includes a control system in communication with a gas discharge chamber. The control system includes a performance monitoring module configured to, during standard mode of operation of the gas discharge chamber and in between performance of gas recovery schemes on the gas discharge chamber that use a gas recovery setting: compare one or more performance parameters of the gas discharge chamber to respective thresholds; determine whether the gas recovery setting needs to be adjusted based on the comparison; and adjust the value for the gas recovery setting based on the determination. The control system includes a gas recovery module configured to perform the gas recovery scheme, the gas recovery module being configured to access the most recently adjusted value for the gas recovery setting from the performance monitoring module when performing the current gas recovery scheme.