Gas Splitter Manifold Layout for Uniform Chamber Gas Delivery
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional semiconductor processing systems face challenges in efficiently delivering gases to multiple processing chambers with uniform flow and preventing cross-talk, while maintaining thermal uniformity and reducing particle contamination.
Innovation Solution
The system incorporates a gas splitter with multiple inlets and outlets, mixing channels, and passive flow control devices to ensure equal gas flow and prevent cross-talk, along with a remote plasma unit and isolation valves to manage gas delivery and heating mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional gas distribution systems are used to deliver gases to multiple processing chambers, then gas delivery is possible, but uniform gas flow to each chamber is difficult to achieve
Solution Approach 1:
The gas distribution system is segmented into multiple independent gas splitters, each serving specific chambers. Each gas splitter contains separate lumens for different gases (e.g., TEOS gas lumen, oxygen gas lumen) that are independently controlled. This segmentation allows precise control of gas flow to each chamber while maintaining overall system manageability.
Solution Approach 2:
Each gas splitter is designed with local quality features including chamber-specific flow control valves, individual heating zones for different gas lumens, and dedicated mixing channels. This allows each region of the gas distribution system to be optimized for its specific function, achieving uniform gas flow to each chamber independently.
2Adaptability or versatility
If multiple gases are mixed and delivered to processing chambers, then process flexibility is improved, but cross-talk between chambers may occur
Solution Approach 1:
The gas distribution system uses physically separate lumens for different process gases (TEOS, oxygen, nitrogen, etc.) that extend individually to each chamber. This segmentation prevents gas mixing in transit and eliminates cross-contamination between chambers, while still allowing flexible composition of gas mixtures at each chamber inlet.
Solution Approach 2:
Individual mixing valves and flow control devices act as intermediaries between the main gas supply and each chamber. These intermediaries allow precise control of gas composition for each chamber independently, enabling process flexibility while preventing cross-talk through isolated control points.
3Manufacturing precision
If gas delivery system components are added to improve flow control, then gas distribution uniformity is improved, but particle contamination increases
Solution Approach 1:
Multiple functions are merged into integrated components: gas splitters combine flow control valves, mixing channels, and heating elements into single monolithic structures. This merging eliminates the need for multiple separate components that would require multiple connections and seals, thereby reducing particle contamination sources while maintaining precise flow control.
Solution Approach 2:
The gas distribution system incorporates self-contained features within each gas splitter, including integrated heating zones that maintain gas temperature without external heaters, and built-in mixing channels that eliminate the need for separate mixing vessels. This self-service approach reduces the number of external connections and potential contamination points.
4Temperature
If thermal control is applied to gas delivery, then gas temperature uniformity is improved, but energy consumption increases
Solution Approach 1:
The gas distribution system implements localized heating zones within each gas splitter, positioned only where and when heating is required for specific gas lumens. This local quality approach allows thermal control to be applied selectively to maintain gas temperature uniformity without heating the entire system continuously, thereby reducing overall energy consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides scalable multi-substrate processing with uniform gas distribution, reduced thermal non-uniformity, and minimized particle contamination, enhancing processing efficiency and throughput.
Implementation Method 1
The gas splitter may define a plurality of first gas lumens that extend between and fluidly couple the first gas inlet with each of the plurality of first gas outlets
Implementation Method 2
The systems may include a remote plasma unit supported above the gas splitter
Implementation Method 3
The gas splitter may include a heat source
Data Source
AI summary
Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may include a top surface and side surfaces. The gas splitter may define a first and second gas inlets, with each gas inlet extending through one side surface. The gas splitter may define first and second gas outlets extending through the top surface. The gas splitter may define first and second gas lumens that extend between and fluidly couple each gas inlet with corresponding gas outlets. The gas splitter may define mixing channels that include a mixing outlet extending through a side surface and a mixing inlet extending through the top surface. The systems may include output manifolds seated on the lid plate. The systems may include output weldments that fluidly couple each mixing outlet with a respective one of the output manifolds.