Compact Gas Supply Apparatus for Semiconductor Reactors
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Solution Overview
Problem
Conventional gas supply apparatuses for semiconductor manufacturing require numerous flow controllers, leading to large and costly systems with complex maintenance, as they need to be installed for each processing reactor.
Innovation Solution
A compact gas supply apparatus design utilizing a single pressure type flow controller with a pressure detector, control valves, orifices, and arithmetic circuits to regulate flow rates across multiple processing reactors, eliminating the need for individual flow controllers at each reactor.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a flow controller is provided for each processing reactor, then the flow rate control accuracy is improved, but the device complexity and production cost increase significantly
Solution Approach 1:
The patent merges multiple flow control functions into a single pressure type flow controller that serves multiple processing reactors. Instead of installing separate flow controllers for each reactor, one unified controller with multiple control valves manages gas distribution to all reactors, dramatically reducing system complexity while maintaining control accuracy
Solution Approach 2:
The pressure type flow controller is designed as a universal device that can control gas flow to multiple different processing reactors simultaneously. The controller includes multiple control valves that can be independently adjusted to provide precise flow control for each reactor while using a single integrated unit
2Reliability
If numerous flow controllers are installed, then the flow rate control for each reactor is improved, but the maintenance difficulty and time consumption increase
Solution Approach 1:
By combining multiple flow control functions into one centralized pressure type flow controller, the patent reduces the total number of devices requiring maintenance. A single maintenance team can service one unified controller rather than multiple separate units across different locations, significantly reducing maintenance time and complexity
3Adaptability or versatility
If a large number of flow controllers are used, then the gas flow control coverage is improved, but the apparatus size and production cost increase
Solution Approach 1:
The pressure type flow controller is designed as a universal multi-functional device that can serve multiple processing reactors simultaneously. The compact unified design provides broad gas flow control coverage across the entire semiconductor manufacturing system without requiring proportionally large apparatus size
Solution Approach 2:
The patent transitions from a distributed architecture (multiple separate controllers at different locations) to a centralized architecture (single controller in one location). This dimensional change in system organization reduces the overall spatial footprint while maintaining comprehensive control coverage through the main gas pipe network
4Measurement precision
If individual flow controllers are installed at each reactor, then the flow control precision is improved, but the running cost and replacement parts requirements increase
Solution Approach 1:
The patent combines multiple flow control functions into a single pressure type flow controller unit. This consolidation reduces production costs by manufacturing and installing one unified device rather than multiple separate controllers, while still providing precise flow control to multiple reactors through integrated control valves
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design reduces production costs and simplifies maintenance by allowing a single pressure type flow controller to manage multiple reactors, achieving accurate and efficient gas flow control while minimizing equipment size and complexity.
Implementation Method 1
a pressure detector provided in the main gas pipe
Implementation Method 2
a control valve provided in each of the branch pipes
Implementation Method 3
an orifice provided downstream or upstream of the control valve
Implementation Method 4
an arithmetic circuit for determining a flow rate Qc=KP1 (K is a constant) from a detected pressure P1 from the pressure detector
Data Source
AI summary
There is provided a gas supply apparatus 10 which does not necessitate installation of a pressure type flow controller for each processing reactor and which enables a compact construction of the flow controller. The gas supply apparatus 10 includes gas supply sources 11a, 11b, gas introduction pipes 13a, 13b, a main gas pipe 15, and branch pipes 21a, 21b. A pressure type flow controller 30 is provided for the main gas pipe 15 and the branch pipes 21a, 21b. The pressure type flow controller 30 includes a pressure detector 17 provided in the main gas pipe 15, and control valves 23a, 23b and orifices 22a, 22b, both provided in the branch pipes 21a, 21b. An arithmetic circuit 40 determines a flow rate Qc based on a detected pressure P1 from the pressure detector 17, and an arithmetic control circuit 58 controls the control valves 23a, 23b based on a set flow rate signal Qs from a flow rate setting circuit 52 and on the flow rate Qc from the arithmetic circuit 40.