Gas Supply System Buffer Tank Pressure Control
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Solution Overview
Problem
Semiconductor epitaxy processes face challenges in maintaining optimal flow rates and pressures, particularly with high-pressure gases, where delivery pressure drops due to high flow resistance in gas regulators, leading to apparatus malfunction when using low-pressure liquefied gases.
Innovation Solution
A gas-supply system incorporating a buffer tank and mass-flow controllers to regulate and maintain a stable pressure range, coupled with a pressure transducer and operation device to adjust flow rates, ensuring consistent delivery pressure and flow rates to semiconductor apparatuses, regardless of gas type (high or low pressure).
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If high-pressure liquefied gas is transmitted at very high pressure, then flow rate and pressure requirements of epitaxy apparatus are satisfied, but system complexity and safety risks increase
Solution Approach 1:
The patent introduces a buffer tank as an intermediary component between the gas source and the epitaxy apparatus. The buffer tank receives high-pressure gas, stores it, and then supplies gas at controlled pressures to the apparatus, acting as a mediator that decouples the high-pressure transmission requirement from the apparatus operation, thereby reducing system complexity while maintaining productivity
Solution Approach 2:
The gas supply system is segmented into distinct functional zones: a high-pressure transmission line for efficient gas transport, a buffer tank for pressure equalization and storage, and a low-pressure supply line to the epitaxy apparatus. This segmentation allows each component to operate at optimal pressures, satisfying flow rate requirements while reducing overall system complexity
2Ease of operation
If low-pressure liquefied gas is transmitted, then safety and ease of operation improve, but flow rate and pressure requirements of epitaxy apparatus cannot be satisfied
Solution Approach 1:
The buffer tank performs preliminary action by pre-storing gas at high pressure before it reaches the epitaxy apparatus. This allows the apparatus to receive sufficient flow rates without requiring high-pressure transmission throughout the entire system, making operation easier while maintaining productivity
Solution Approach 2:
The buffer tank serves as an intermediary that converts high-pressure gas into a controllable low-pressure supply for the epitaxy apparatus, enabling safe and easy operation while still delivering the required flow rates through controlled release from the buffer tank
3Device complexity
If gas pressure is not maintained within predetermined range, then apparatus operation becomes simpler, but gas liquefaction occurs and operational consistency is lost
Solution Approach 1:
The patent implements a feedback control system where pressure transducers continuously monitor gas pressure in the buffer tank and supply lines, and control modules automatically adjust flow rates to maintain pressure within the predetermined range. This feedback mechanism ensures operational consistency without requiring complex manual control
Solution Approach 2:
The control system operates autonomously to maintain pressure within the optimal range, automatically adjusting flow rates based on real-time pressure measurements. This self-service capability ensures reliable operation while keeping control complexity manageable through automated regulation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively maintains the delivery pressure within a predetermined range, ensuring the semiconductor apparatus operates efficiently with both high and low-pressure gases, preventing apparatus malfunction and maintaining optimal performance.
Implementation Method 1
a pressure transducer installed on a tube connected to the gas flow controller and configured to generate a pressure signal to the control module according to the pressure of the gas in the tube
Implementation Method 2
the gas flow controller is configured to adjust a flow rate of the gas in the tube in response to the control signal
Data Source
AI summary
A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container via a first tube, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a pressure transducer installed on a second tube connected to the gas flow controller and configured to generate a pressure signal to the operation device according to the pressure of the gas in the second tube. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas in the second tube according to the control signal.