Gas Supply Device Constricted Flow Path for ALD

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Solution Overview

Problem

Existing gas supply systems in semiconductor manufacturing face challenges in accurately detecting the flow rate of raw material gases, leading to instability and errors in film formation processes during atomic layer deposition (ALD).

Innovation Solution

A gas supply device with a constricted flow path and a flow meter configuration, including an orifice that increases the average pressure between the flow meter and the constricted flow path, enhances the accuracy of flow rate detection by reducing pressure fluctuations and stabilizing gas flow rates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a conventional gas supply system is used, then the gas supply process is simple, but the flow rate detection accuracy of raw material gas is poor

Engineering Contradiction:

Improveflow rate detection accuracyVSAvoidgas supply system complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The gas supply system is segmented into distinct functional zones: a first gas supply path for carrier gas, a second gas supply path for raw material gas, and a mixed gas supply path. The flow measurement section is further segmented with separate flow meters for carrier gas and mixed gas, allowing independent measurement and calculation of raw material gas flow rate.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Carrier gas is introduced as an intermediary substance to transport the raw material from the liquid raw material storage to the processing container. The carrier gas flow serves as a measurable reference that, when combined with mixed gas flow measurements, enables indirect but accurate determination of the raw material gas flow rate.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Measurement precision

If pressure fluctuations occur in the gas supply path, then the gas supply process is dynamic, but the flow rate detection accuracy deteriorates

Engineering Contradiction:

Improveflow rate detection accuracyVSAvoidgas flow stability

Core Design Contradiction:

Measurement precisionVSStability of the object's composition

Solution Approach 1:

The system implements feedback measurement by using flow meters to continuously monitor both carrier gas flow rate and mixed gas flow rate. The controller calculates the raw material gas flow rate based on these real-time measurements, enabling dynamic compensation for pressure fluctuations and ensuring accurate flow rate detection under varying conditions.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The patent replaces direct mechanical measurement of raw material gas flow with a calculation-based approach. Instead of installing a flow meter directly in the raw material gas path, the system uses flow measurements of carrier gas and mixed gas, combined with pressure and temperature data, to compute the raw material gas flow rate, thereby avoiding measurement interference from pressure fluctuations.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves the accuracy of detecting the flow rate of raw material gases, resulting in more stable and precise film formation processes, reducing errors and ensuring consistent film thickness.

Implementation Method 1

a constricted flow path provided on a downstream side of the flow meter in the gas supply path and configured to increase an average pressure value between the constricted flow path and the flow meter in the gas supply path

Methodology Applied

Scientific EffectPressure differential: Pressure Gradient

Implementation Method 2

a flow meter provided in the gas supply path and configured to measure a flow rate of the processing gas

Methodology Applied

Scientific EffectFlow measurement:

Implementation Method 3

a carrier gas supply configured to supply a carrier gas into the raw material container; a gas supply path configured to supply the processing gas, which includes the raw material that has been vaporized and the carrier gas, from the raw material container to the processing container

Methodology Applied

Scientific EffectPressure gradient-driven flow: Pressure Gradient

Data Source

PatentUS20220356581A1Gas supply device and gas supply method

Publication Date: 2022.11.10 TOKYO ELECTRON LTD

AI summary

A gas supply device that supplies a processing gas to a processing container storing a substrate and performs a process includes: a raw material container configured to accommodate a liquid raw material or a solid raw material; a carrier gas supply configured to supply a carrier gas into the raw material container; a gas supply path configured to supply the processing gas, which includes the raw material that has been vaporized and the carrier gas, from the raw material container to the processing container; a flow meter provided in the gas supply path and configured to measure a flow rate of the processing gas; and a constricted flow path provided on a downstream side of the flow meter in the gas supply path and configured to increase an average pressure value between the constricted flow path and the flow meter in the gas supply path.