3D-Printed Gas Supply Suppressor for Stable Plasma Processing
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Solution Overview
Problem
During plasma processing, the electric field formed between the electrostatic chuck and the grounded conductive supporter can cause discharge in the gas supply line, destabilizing the plasma processing apparatus and affecting the etching process quality, potentially damaging the equipment and preventing stable substrate adsorption.
Innovation Solution
A discharge suppressor is integrated into the gas supply line using 3D printing, featuring a gas supply flow path with a length of 5 mm or less in the direction of the electric field, preventing electron acceleration and ionization of neutral gas, thus suppressing discharge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the gas supply line is positioned in the electric field region between the electrostatic chuck and conductive supporter, then heat transfer gas can be supplied to the substrate, but discharge occurs in the gas supply line causing plasma instability
Solution Approach 1:
The patent introduces a discharge suppressor as an intermediary component in the gas supply line. This suppressor acts as a mediator that allows heat transfer gas to pass through while preventing electron acceleration and discharge. The discharge suppressor is positioned within the electric field region and contains features such as a mesh structure or multiple partitions that block electron movement paths without obstructing gas flow, thus resolving the contradiction between gas supply and plasma stability
Solution Approach 2:
The patent addresses the discharge issue by adding a spatial dimension to the gas supply line design. Instead of simply running the gas line straight through the electric field, the suppressor introduces a multi-dimensional structure with mesh patterns, partitions, or serpentine paths that extend the electron travel distance in three-dimensional space. This dimensional complexity prevents electrons from forming discharge paths while maintaining gas flow efficiency
2Device complexity
If a conventional gas supply line is used without discharge suppression features, then the structure is simple, but discharge occurs causing equipment damage and process instability
Solution Approach 1:
The discharge suppressor serves as a protective intermediary element integrated into the gas supply line. It mediates between the electric field environment and the gas supply system, preventing harmful discharge effects from reaching and damaging the gas supply line and surrounding equipment. The suppressor absorbs or blocks the harmful electromagnetic and particle effects while allowing normal gas flow
Solution Approach 2:
The patent implements a preventive approach by placing the discharge suppressor beforehand in the gas supply path, before discharge can occur. The suppressor is positioned upstream in the electric field region to preemptively block electron acceleration and prevent discharge formation, thereby cushioning the system against potential damage before it can affect the gas supply line or equipment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents discharge in the gas supply line, maintaining plasma stability, ensuring consistent etching processes and protecting the apparatus from damage.
Implementation Method 1
preventing electron acceleration and ionization of neutral gas, thus suppressing discharge
Implementation Method 2
the electric field formed between the electrostatic chuck and the grounded conductive supporter can cause discharge in the gas supply line
Implementation Method 3
a high-frequency power supply applying high-frequency power to the lower electrode
Implementation Method 4
an electrostatic chuck supporting a substrate
Data Source
AI summary
A plasma processing apparatus includes a process chamber in which a substrate processing process is performed; an electrostatic chuck having a microcavity; a lower electrode disposed to be in contact with a lower surface of the electrostatic chuck; a high-frequency power supply applying high-frequency power to the lower electrode; a conductive supporter disposed to be spaced apart from a lower portion of the lower electrode and grounded thereto; and a discharge suppressor located between the lower electrode and the conductive supporter, having a gas supply flow path forming a portion of a gas supply line, and molded by three dimensional printing, wherein the gas supply flow path has a space portion having a length of 5 mm or less in a direction of an electric field formed by the high-frequency power and connecting upper and lower surfaces of the discharge suppressor.