Gas Supply Unit with Divider Plate Protrusions for Film Thickness Uniformity
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Solution Overview
Problem
Current gas supply units in semiconductor manufacturing, such as those using shower plates, often result in non-uniform film deposition across substrates due to variations in gas flow, particularly at the edge and center portions, leading to inconsistencies in film thickness.
Innovation Solution
A gas supply unit with a center injection hole and concentric outer injection holes, guided by a divider plate with protrusions creating zones, allows for independent control of gas flow rates and pressures through separate gas lines and splitters, enabling precise control over film deposition uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a shower plate is used for gas supply, then gas can be supplied uniformly onto the substrate in a coaxial shape, but the film thickness at the edge portion and center portion of the substrate becomes non-uniform due to gas flows in exhaust ports and gate valves
Solution Approach 1:
The gas supply system is segmented into multiple independent zones (center zone with center injection hole, edge zones with outer injection holes) that can be controlled separately. The divider plate creates distinct gas flow paths for different regions, allowing independent optimization of gas distribution to achieve uniform film thickness across the substrate surface
Solution Approach 2:
Different regions of the substrate receive gas with different flow rates and pressures tailored to their specific needs. The center region and edge regions have separate gas lines and flow controllers, enabling local adjustment of gas supply characteristics to compensate for edge effects and achieve uniform film deposition across the entire substrate
2Manufacturing precision
If separate gas lines are used for center and outer injection holes, then gas flow rates can be independently controlled, but the device complexity increases
Solution Approach 1:
The gas distribution system is divided into separate zones with independent gas lines, flow controllers, and splitters for the center injection hole and outer injection holes. This segmentation enables precise independent control of gas flow rates to different substrate regions, achieving uniform film deposition despite the increased structural complexity
Solution Approach 2:
Gas splitters are introduced as intermediary components in the gas lines to distribute and regulate gas flow to multiple injection holes. These splitters act as mediators that simplify the control mechanism by providing passive flow distribution, reducing the need for complex active control systems while maintaining precise flow control
Data Source
AI summary
A gas supply unit is disclosed. Exemplary gas supply unit includes an upper plate provided with a plurality of injection holes, the plurality of injection holes comprising a center injection hole and a plurality of outer injection holes; a divider plate constructed and arranged against the upper plate to guide a flow of gas from the injection holes; a first gas line fluidly coupled to the center injection hole; and a plurality of second gas lines fluidly coupled to the plurality of outer injection holes. The plurality of outer injection holes is arranged concentrically around the center injection hole. The divider plate is provided with a center through hole fluidly communicating with the center injection hole and is provided with a plurality of protrusions extending towards the upper plate thereby creating a plurality of zones, each of the zones fluidly communicating with one of the outer injection holes.