Gas Supply Joint Pressure Control for Atmospheric Isolation

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Solution Overview

Problem

Substrate processing apparatuses face challenges in minimizing the influence of atmospheric components, such as oxygen, which can permeate and react with process gases, leading to particle generation and deposition, requiring frequent cleaning and affecting film formation quality.

Innovation Solution

The apparatus incorporates a joint part and pressure adjustment mechanism to isolate the gas introduction and process gas transfer pipes from the atmosphere, using O-rings and pressure adjustment spaces to maintain a consistent pressure and prevent atmospheric components from entering the process chamber, thereby reducing the impact of oxygen on the process gas.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If gas introduction pipe and process gas transfer pipe are directly connected in the process chamber, then gas supply is simple, but atmospheric components permeate into the process chamber causing particle generation

Engineering Contradiction:
Improvefilm formation qualityVSAvoidgas supply system structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The gas supply system is segmented into multiple isolated spaces: the process chamber (first space), the joint part region (second space), and the pressure adjustment space. This segmentation prevents atmospheric components from the process chamber from reaching the gas introduction pipe, eliminating particle generation while maintaining a manageable system structure through modular design

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The joint part acts as an intermediary component connecting the process chamber and the gas supply system. It introduces a pressure adjustment space that serves as a buffer zone, allowing pressure control to prevent atmospheric permeation without requiring direct modification of the gas introduction pipe or process chamber structure

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If pressure adjustment space is introduced to prevent atmospheric permeation, then film formation quality improves, but device complexity increases

Engineering Contradiction:
Improvefilm formation qualityVSAvoidjoint part structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The joint part combines multiple functions into a single integrated component: it serves as the connection interface between the process chamber and gas supply system, houses the pressure adjustment space, and provides the sealing structure with O-rings. This merging approach improves film formation quality through effective atmospheric isolation while minimizing device complexity by consolidating functions rather than adding separate components

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively suppresses the entry of atmospheric components, minimizing reactant generation and particle deposition, allowing for more reliable and efficient film formation without the need for frequent cleaning, by maintaining a controlled environment within the process chamber.

Implementation Method 1

a pressure adjustment part provided between the adjacent part and the second space

Methodology Applied
Scientific EffectPressure equilibrium: Pascal's Law

Implementation Method 2

an first O-ring provided between the gas introduction pipe and the joint part, and an second O-ring provided between the process gas transfer pipe and the joint part

Methodology Applied
Scientific EffectSealing:

Data Source

PatentUS11124872B2Substrate processing apparatus
Publication Date: 2021.09.21 KOKUSAI DENKI KK
  • US11124872B2 patent drawing
  • US11124872B2 patent drawing
  • US11124872B2 patent drawing

AI summary

Described herein is a technique capable of suppressing an air atmosphere from entering a process chamber. According to one aspect thereof, there is provided a substrate processing apparatus including: a substrate support configured to support a substrate; a process chamber having a first space where the substrate is processed; an exhaust part configured to exhaust atmosphere of the first space; and a gas supply system including: a gas introduction pipe configured to supply gas to the first space; a process gas transfer pipe configured to communicate with the gas introduction pipe; a joint part configured to cover an adjacent part provided adjacent to the gas introduction pipe and the process gas transfer pipe in a second space outside the first space, and configured to fix the gas introduction pipe with the process gas transfer pipe; and a pressure adjustment part provided between the adjacent part and the second space.