Integrated Gas Supply Nozzle Filter for Particle Diffusion Control
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in suppressing particle diffusion into the processing chamber and incur increased costs due to filter exchange requirements, particularly when exchanging filters exposed to the atmosphere, which leads to moisture adhesion and particle generation.
Innovation Solution
A substrate processing apparatus with a gas supply part that includes a filter integrated within the gas supply nozzle, preventing direct exposure to the atmosphere during filter exchange and reducing the need for additional heating mechanisms, thereby minimizing the time and cost associated with filter replacement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a filter is provided to the piping connecting the vaporizer and the processing chamber, then particles generated in the vaporizer and piping are suppressed from diffusing into the processing chamber, but the inside of the vaporizer and piping are exposed to the atmosphere when the filter is exchanged, causing moisture adhesion and particle generation
Solution Approach 1:
The filter is nested inside the vaporizer body, specifically positioned within the vaporization chamber where vaporized gas is generated. This integration allows the filter to be surrounded by the vaporizer structure, preventing direct exposure to the atmosphere during filter exchange operations while maintaining its particle filtration function.
Solution Approach 2:
The vaporizer body acts as an intermediary structure that houses the filter, creating a protective barrier between the filter and the external atmosphere. This intermediary arrangement enables filter replacement without direct atmospheric exposure, eliminating moisture adhesion issues while maintaining particle suppression capability.
2Ease of operation
If the filter is exchanged by exposing it to the atmosphere, then filter replacement is simplified, but additional piping members and heating heaters must be installed and removed, increasing exchange time and cost
Solution Approach 1:
By nesting the filter inside the vaporizer body rather than attaching it to external piping, the filter can be exchanged independently without requiring disassembly of additional piping members or heating heaters. This reduces exchange complexity and time while maintaining effective particle suppression.
Solution Approach 2:
The filter is merged with the vaporizer body as an integrated component, eliminating the need for separate piping members and heating heaters that would require installation and removal during filter exchange. This consolidation simplifies the exchange process and reduces associated costs.
3Ease of operation
If the filter is positioned outside the processing chamber, then filter exchange is easier, but particles can diffuse into the processing chamber more easily
Solution Approach 1:
The filter is nested within the vaporizer body which is positioned such that the filter remains accessible for exchange while being upstream of the processing chamber. This nested arrangement ensures particles are filtered before entering the processing chamber while maintaining operational accessibility.
Solution Approach 2:
The vaporizer body serves as an intermediary structure that positions the filter in an optimal location - close enough to the processing chamber to effectively filter particles before they enter, yet positioned such that the filter can be exchanged without compromising particle suppression capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The integrated filter design effectively suppresses particle diffusion into the processing chamber, extends filter service life, and reduces the cost and time required for filter exchange, enhancing overall processing efficiency and cost-effectiveness.
Implementation Method 1
a filter disposed in the gas supply nozzle, for removing impurities contained in the processing gas
Data Source
AI summary
To inhibit a diffusion of particles into a processing chamber and reduce a cost required for exchanging a gas filter. A substrate processing apparatus comprises: a processing chamber processing substrates; a gas supply part supplying processing gas into the processing chamber; wherein the gas supply part has a gas supply nozzle disposed in the processing chamber; a filter removing impurities contained in the processing gas; and a gas supply port opened in the gas supply nozzle, for supplying into the processing chamber the processing gas from which impurities are removed by the filter.


