Gas Supply Apparatus Vaporizer Flow Control
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Solution Overview
Problem
Conventional gas supply apparatuses face challenges in accurately controlling gas flow rates due to errors in liquid type thermal mass flow rate control, leading to increased size and complexity, and energy inefficiencies when using high-temperature type thermal mass flow rate control devices.
Innovation Solution
A gas supply apparatus combining a vaporizer with a high-temperature type pressure type flow rate control device, featuring a vaporizing chamber with orifices for pulsation dampening and heaters for uniform heating, along with a buffer tank for pressure stabilization, allowing for accurate flow rate control with 'rough' temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a liquid type thermal mass flow rate control device is used, then the device structure is simple, but the gas flow rate control accuracy becomes poor
Solution Approach 1:
The invention changes the measurement parameter from liquid flow rate to gas flow rate by placing the flow rate control device after the vaporizer. This allows the device to directly measure and control the vaporized gas flow rate, eliminating the conversion error that occurs when measuring liquid flow rate and then vaporizing it. The parameter change from liquid state to gas state measurement resolves the contradiction between simple device structure and accurate flow rate control.
2Measurement precision
If a high-temperature type thermal mass flow rate control device is used, then the gas flow rate control accuracy is improved, but the device size and heating volume must be increased
Solution Approach 1:
The invention introduces a buffer tank as an intermediary component between the vaporizer and the flow rate control device. This buffer tank stabilizes the primary side flow rate and pressure, allowing the high-temperature type thermal mass flow rate control device to operate accurately without requiring excessive heating volume or enlarged device size. The buffer tank acts as a mediator that decouples the temperature control requirements from the flow rate measurement accuracy.
3Measurement precision
If high-temperature type thermal mass flow rate control device is used, then the gas flow rate control accuracy is improved, but the energy consumption increases
Solution Approach 1:
The invention performs preliminary vaporization of the liquid in a separate vaporizer unit before the gas enters the high-temperature type thermal mass flow rate control device. This preliminary action separates the heating function from the flow rate measurement function, allowing the flow rate control device to operate at its optimal temperature without requiring excessive energy input. The vaporizer prepares the gas in advance, reducing the energy burden on the flow rate control device.
4Measurement precision
If high-temperature type thermal mass flow rate control device is used, then the gas flow rate control accuracy is improved, but the temperature control complexity increases
Solution Approach 1:
The invention segments the system into distinct functional units: a vaporizer for liquid-to-gas conversion, a buffer tank for flow stabilization, and a high-temperature type thermal mass flow rate control device for accurate flow measurement. This segmentation allows each component to be optimized independently, with the temperature control complexity confined to the vaporizer and buffer tank, while the flow rate control device operates under simpler thermal conditions. The functional segmentation resolves the contradiction between measurement precision and temperature control complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables stable and accurate gas flow rate control with reduced temperature and pressure control requirements, minimizing size and energy consumption while maintaining high accuracy.
Implementation Method 1
a vaporizer (1) that vaporizes liquid fed from the liquid receiving tank (T) by use of pressure
Implementation Method 2
heating devices (6 to 8) that heat the vaporizer (1), the high-temperature type pressure type flow rate control device (2), and desired portions of pipe passages (19) connected to the vaporizer (1) and the high-temperature type pressure type flow rate control device (2)
Data Source
AI summary
An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.