Gate Protected Group III-Nitride Semiconductor Devices

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Solution Overview

Problem

Group III-nitride semiconductor devices face challenges with gate overdrive protection, as off-chip Zener diodes are required for voltage limiting and transient suppression, which limits switching speed and cannot be fabricated on-chip due to difficulties in heavily doping wide-bandgap materials needed for Zener breakdown voltage.

Innovation Solution

An integrated gate overdrive protection circuit is formed within the same group III-nitride semiconductor material, using a gate-voltage-controlling transistor embedded in the gate electrode to provide immunity to high gate drive voltages and accidental voltage surges, ensuring reliable operation at high temperatures and in noisy environments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If off-chip Zener diodes are used for gate voltage limiting and transient suppression, then gate overdrive protection is achieved, but switching speed is limited and device complexity increases

Engineering Contradiction:
Improvegate overdrive protectionVSAvoidswitching speed
Core Design Contradiction:
ReliabilityVSSpeed

Solution Approach 1:

The patent merges the protection function with the gate electrode structure by embedding a depletion-mode HEMT directly into the gate. This integration eliminates the need for separate off-chip Zener diodes, thereby achieving gate overdrive protection while maintaining fast switching speeds through monolithic integration on the same semiconductor substrate.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The depletion-mode HEMT is nested within the gate electrode structure, with its source electrode connected to the gate electrode and drain electrode connected to ground. This nested configuration allows the protection device to be embedded inside the existing gate structure, achieving protection without adding external components that would limit switching speed.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Reliability

If off-chip Zener diodes are used for voltage limiting, then gate protection is provided, but wire-bond pads and connections are required increasing device area

Engineering Contradiction:
Improvegate protectionVSAvoidwire-bond pad area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The protection function is merged into the gate electrode itself through the embedded depletion-mode HEMT, eliminating the need for separate off-chip Zener diodes and their associated wire-bond pads. This integration significantly reduces the device area by removing external protection components.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent extracts the protection function from external off-chip components and relocates it directly into the semiconductor device structure. By taking out the need for separate Zener diodes and wire-bond connections, the solution reduces the required device area while maintaining protection functionality.

Inventive Principle:
Principle #2Taking out (Extraction)

3Reliability

If heavily doped materials are used for Zener breakdown voltage, then voltage limiting is achieved, but wide-bandgap group III-nitride materials are difficult to dope heavily

Engineering Contradiction:
Improvevoltage limiting capabilityVSAvoiddoping difficulty
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the operational parameter from relying on heavily doped Zener breakdown (which is difficult in wide-bandgap materials) to using the natural threshold voltage characteristics of the depletion-mode HEMT. This parameter change allows voltage limiting to be achieved through the HEMT's inherent electrical characteristics rather than through heavy doping, making the process compatible with group III-nitride material fabrication.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The solution replaces the complex heavily doped Zener diode structure (which is difficult and expensive to manufacture in wide-bandgap materials) with a simpler depletion-mode HEMT that utilizes natural threshold voltage effects. This substitution uses more easily manufacturable structures and processes compatible with group III-nitride technology.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

4Productivity

If gate electrode is over-driven to minimize on-resistance, then output current is maximized, but gate failure occurs due to exponential current-voltage relationship

Engineering Contradiction:
Improveoutput currentVSAvoidgate reliability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The depletion-mode HEMT is configured to provide preliminary protection against gate overdrive by clamping the gate voltage through its threshold voltage characteristic. This preliminary anti-action prevents the gate voltage from exceeding safe levels, thereby avoiding the exponential current increase that would lead to gate failure while still allowing sufficient current to flow for normal operation.

Inventive Principle:
Principle #9Preliminary anti-action

Solution Approach 2:

The embedded depletion-mode HEMT provides automatic feedback control of the gate voltage. When the gate voltage attempts to exceed the threshold voltage of the depletion-mode HEMT, the HEMT activates and clamps the voltage, creating a self-regulating system that prevents overdrive conditions without requiring external control circuits.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS9160326B2Gate protected semiconductor devices
Publication Date: 2015.10.13 THE HONG KONG UNIV OF SCI & TECH
  • US9160326B2 patent drawing
  • US9160326B2 patent drawing
  • US9160326B2 patent drawing

AI summary

Providing gate protection to a group III-semiconductor device by delivering gate overdrive immunity is described herein. The gate protection can be achieved by embedding a gate-voltage-controlling second transistor to the gate electrode of a first transistor. In other words, a first gate electrode of the first semiconductor device is in series with a second source electrode of the second semiconductor device, and a second gate electrode of the second semiconductor device is connected to the second source electrode and the first gate electrode.