Gemini Surfactant Rinse Composition for EUV Lithography

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Solution Overview

Problem

In EUV lithography, pattern collapse occurs during the rinsing process due to high surface tension of the rinse composition, especially in patterns with large aspect ratios, which affects device performance and requires a PFAS-free surfactant to mitigate environmental hazards.

Innovation Solution

A photolithographic rinse composition is developed using a gemini-type surfactant with a main chain including hydrophobic and hydrophilic groups, side chains, and a hydrophilic functional group, along with a solvent, to prevent pattern collapse without using PFAS-based surfactants.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional rinse composition is used, then the rinsing process is simple, but pattern collapse occurs due to high surface tension

Engineering Contradiction:

Improvepattern stabilityVSAvoidsurface tension

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the chemical composition parameters of the rinse composition by introducing a gemini-type surfactant with specific structure (two hydrophobic groups, two hydrophilic groups, and a spacer unit). This structural parameter change reduces the surface tension of the rinse composition from conventional high levels to below 30 mN/m, thereby preventing pattern collapse while maintaining rinsing effectiveness

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite surfactant system combining hydrophobic groups (such as alkyl or aryl groups with 6-12 carbon atoms) and hydrophilic groups (such as carboxylic acid groups, sulfonic acid groups, or sulfate groups) connected by a spacer unit. This composite structure enables the surfactant to simultaneously interact with both the photoresist pattern and the aqueous rinse medium, effectively reducing surface tension and preventing pattern collapse

Inventive Principle:

Principle #40Composite materials

2Reliability

If PFAS-based surfactant is used, then pattern collapse is improved, but environmental hazards increase

Engineering Contradiction:

Improvepattern stabilityVSAvoidenvironmental hazard

Core Design Contradiction:

ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent replaces persistent PFAS-based surfactants with biodegradable alternative surfactants that have shorter environmental persistence. The gemini-type surfactant used contains hydrolyzable bonds (such as ester or amide bonds in the spacer unit) that allow microbial degradation, making the rinse composition environmentally friendly while maintaining its pattern protection function

Inventive Principle:

Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The patent changes the chemical composition parameters by selecting surfactant components that are inherently less harmful to the environment. Specifically, it uses surfactants with biodegradable spacers (such as alkylene chains with 1-10 carbon atoms or aromatic hydrocarbon chains) and naturally occurring hydrophilic groups, replacing the persistent fluorinated chains characteristic of PFAS substances

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The surfactant composition effectively suppresses deformation and collapse of photoresist patterns, maintaining critical dimension stability and improving manufacturing yield, while also addressing environmental concerns by eliminating PFAS usage.

Implementation Method 1

such a photoresist pattern collapse may be caused by a capillary force due to surface tension of a rinse composition used in the photolithography process. Accordingly, since the surface tension of the rinse composition should be lowered

Methodology Applied

Scientific EffectSurface tension reduction: Surface Tension

Implementation Method 2

a gemini-type surfactant having a main chain including at least two hydrophobic groups, at least one hydrophilic group

Methodology Applied

Scientific EffectAdsorption: Adsorption

Data Source

PatentUS20250147423A1Photolithographic rinse compositions and methods of forming patterns using the compositions

Publication Date: 2025.05.08 SAMSUNG ELECTRONICS CO LTD

AI summary

Disclosed are photolithographic rinse compositions and methods of forming patterns using the same, the photolithographic rinse compositions including a gemini-type surfactant having a main chain including at least two hydrophobic groups and at least one hydrophilic group and at least two side chains branching from the main chain and including a hydrophilic group-including functional group, and a solvent.